Stress-Relaxation Process during Post-Annealing in SGOI Formed by H^+ Irradiation and Oxidation-Induced Ge Condensation

Masanori Tanaka, Taizoh Sadoh, Koji Matsumoto, Toyotsugu Enokida, Masanobu Miyao

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)444-445
Number of pages2
JournalExtended abstracts of the ... Conference on Solid State Devices and Materials
Publication statusPublished - Sept 13 2006

Cite this