Simultaneous in situ measurements of properties of particulates in rf silane plasmas using a polarization-sensitive laser-light-scattering method

Masaharu Shiratani; Hiroharu Kawasaki; Tsuyoshi Fukuzawa; Takashi Yoshioka; Yoshio Ueda; Sanjay Singh; Yukio Watanabe

doi:10.1063/1.360916

Simultaneous in situ measurements of properties of particulates in rf silane plasmas using a polarization-sensitive laser-light-scattering method

Masaharu Shiratani, Hiroharu Kawasaki, Tsuyoshi Fukuzawa, Takashi Yoshioka, Yoshio Ueda, Sanjay Singh, Yukio Watanabe

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Abstract

This work has studied particulate growth process in silane rf discharges and found that they seem to grow rapidly even in a range of their size smaller than 40nm. To observe such rapid growth processes of particulates, a polarization-sensitive laser-light-scattering measurement system is developed, which has a good time resolution and a high sensitivity. Properties of particulates are derived from simultaneous measurements of three differently polarized components of light scattered by the particulates and are successfully determined in a range of size down to 10nm.

Original language	English
Pages (from-to)	104-109
Number of pages	6
Journal	Journal of Applied Physics
Volume	79
Issue number	1
DOIs	https://doi.org/10.1063/1.360916
Publication status	Published - Jan 1 1996

All Science Journal Classification (ASJC) codes

Physics and Astronomy(all)

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10.1063/1.360916

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title = "Simultaneous in situ measurements of properties of particulates in rf silane plasmas using a polarization-sensitive laser-light-scattering method",

abstract = "This work has studied particulate growth process in silane rf discharges and found that they seem to grow rapidly even in a range of their size smaller than 40nm. To observe such rapid growth processes of particulates, a polarization-sensitive laser-light-scattering measurement system is developed, which has a good time resolution and a high sensitivity. Properties of particulates are derived from simultaneous measurements of three differently polarized components of light scattered by the particulates and are successfully determined in a range of size down to 10nm.",

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AU - Shiratani, Masaharu

AU - Kawasaki, Hiroharu

AU - Fukuzawa, Tsuyoshi

AU - Yoshioka, Takashi

AU - Ueda, Yoshio

AU - Singh, Sanjay

AU - Watanabe, Yukio

PY - 1996/1/1

Y1 - 1996/1/1

N2 - This work has studied particulate growth process in silane rf discharges and found that they seem to grow rapidly even in a range of their size smaller than 40nm. To observe such rapid growth processes of particulates, a polarization-sensitive laser-light-scattering measurement system is developed, which has a good time resolution and a high sensitivity. Properties of particulates are derived from simultaneous measurements of three differently polarized components of light scattered by the particulates and are successfully determined in a range of size down to 10nm.

AB - This work has studied particulate growth process in silane rf discharges and found that they seem to grow rapidly even in a range of their size smaller than 40nm. To observe such rapid growth processes of particulates, a polarization-sensitive laser-light-scattering measurement system is developed, which has a good time resolution and a high sensitivity. Properties of particulates are derived from simultaneous measurements of three differently polarized components of light scattered by the particulates and are successfully determined in a range of size down to 10nm.

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Simultaneous in situ measurements of properties of particulates in rf silane plasmas using a polarization-sensitive laser-light-scattering method

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