Self-organized near-field etching of the sidewalls of glass corrugations

T. Yatsui; K. Hirata; Y. Tabata; Y. Miyake; Y. Akita; M. Yoshimoto; W. Nomura; T. Kawazoe; M. Naruse; M. Ohtsu

doi:10.1007/s00340-011-4569-1

Self-organized near-field etching of the sidewalls of glass corrugations

T. Yatsui
, K. Hirata
, Y. Tabata
, Y. Miyake
, Y. Akita
, M. Yoshimoto
, W. Nomura
, T. Kawazoe
, M. Naruse
, M. Ohtsu

Research output: Contribution to journal › Article › peer-review

13 Citations (Scopus)

Abstract

Using soda-lime glass with a nano-stripe pattern as a test specimen, we demonstrated self-organized near-field etching with a continuum-wave laser (λ=532 nm) light source. Atomic force microscopy confirmed that near-field etching decreases the flank roughness of the corrugations as well as the roughness of the flat surface.

Original language	English
Pages (from-to)	527-530
Number of pages	4
Journal	Applied Physics B: Lasers and Optics
Volume	103
Issue number	3
DOIs	https://doi.org/10.1007/s00340-011-4569-1
Publication status	Published - Jun 2011
Externally published	Yes

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)
General Physics and Astronomy

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10.1007/s00340-011-4569-1

Cite this

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title = "Self-organized near-field etching of the sidewalls of glass corrugations",

abstract = "Using soda-lime glass with a nano-stripe pattern as a test specimen, we demonstrated self-organized near-field etching with a continuum-wave laser (λ=532 nm) light source. Atomic force microscopy confirmed that near-field etching decreases the flank roughness of the corrugations as well as the roughness of the flat surface.",

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T1 - Self-organized near-field etching of the sidewalls of glass corrugations

AU - Yatsui, T.

AU - Hirata, K.

AU - Tabata, Y.

AU - Miyake, Y.

AU - Akita, Y.

AU - Yoshimoto, M.

AU - Nomura, W.

AU - Kawazoe, T.

AU - Naruse, M.

AU - Ohtsu, M.

PY - 2011/6

Y1 - 2011/6

N2 - Using soda-lime glass with a nano-stripe pattern as a test specimen, we demonstrated self-organized near-field etching with a continuum-wave laser (λ=532 nm) light source. Atomic force microscopy confirmed that near-field etching decreases the flank roughness of the corrugations as well as the roughness of the flat surface.

AB - Using soda-lime glass with a nano-stripe pattern as a test specimen, we demonstrated self-organized near-field etching with a continuum-wave laser (λ=532 nm) light source. Atomic force microscopy confirmed that near-field etching decreases the flank roughness of the corrugations as well as the roughness of the flat surface.

UR - https://www.scopus.com/pages/publications/79959493184

UR - https://www.scopus.com/pages/publications/79959493184#tab=citedBy

U2 - 10.1007/s00340-011-4569-1

DO - 10.1007/s00340-011-4569-1

M3 - Article

AN - SCOPUS:79959493184

SN - 0946-2171

VL - 103

SP - 527

EP - 530

JO - Applied Physics B: Lasers and Optics

JF - Applied Physics B: Lasers and Optics

IS - 3

ER -

Self-organized near-field etching of the sidewalls of glass corrugations

Abstract

All Science Journal Classification (ASJC) codes

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