Self-organized near-field etching of the sidewalls of glass corrugations

T. Yatsui, K. Hirata, Y. Tabata, Y. Miyake, Y. Akita, M. Yoshimoto, W. Nomura, T. Kawazoe, M. Naruse, M. Ohtsu

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)


Using soda-lime glass with a nano-stripe pattern as a test specimen, we demonstrated self-organized near-field etching with a continuum-wave laser (λ=532 nm) light source. Atomic force microscopy confirmed that near-field etching decreases the flank roughness of the corrugations as well as the roughness of the flat surface.

Original languageEnglish
Pages (from-to)527-530
Number of pages4
JournalApplied Physics B: Lasers and Optics
Issue number3
Publication statusPublished - Jun 2011
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)


Dive into the research topics of 'Self-organized near-field etching of the sidewalls of glass corrugations'. Together they form a unique fingerprint.

Cite this