The hierarchical pattern formation with three stages, that is, (1) film-thickness topography, (2) fractal or concentric-ring pattern, and (3) cone morphology at micron or sub-micrometer order, was found here for the first time in the BN films prepared by plasma CVD assisted with pulsed excimer laser irradiation at 193 nm. The detailed topography consisting of unevenness in the film-thickness was obtained owing to the twodimensional X-ray diffraction (2D-XRD) mapping method using a collimated X-ray of 0.1mm in the diameter, where very high sensitivity was realized by selecting the X-ray from the substrate material, that was exponentially attenuated through the absorption from the film material according to Beer's law. The important roles of the etching reactions in this process were experimentally verified here for the first time due to the 2D-mapping method. The formation mechanism of the hierarchical patterns was discussed.
All Science Journal Classification (ASJC) codes
- General Engineering
- General Physics and Astronomy