Selective area laser-assisted doping of SiC thin films and blue light electroluminescence

Emmanuel Paneerselvam, Toshifumi Kikuchi, Hiroshi Ikenoue, Nilesh J. Vasa, I. A. Palani, Mitsuhiro Higashihata, Daisuke Nakamura, M. S. Ramachandra Rao

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4 Citations (Scopus)


Laser-assisted doping combined with annealing technique is used in selective areas to form a p-n junction on a SiC thin film grown by the pulsed laser deposition on a Si substrate at a temperature of 800 °C. This approach in an aluminum chloride solution and a phosphoric solution has resulted in p-SiC/n-Si and n-SiC/p-Si hetero-structures, respectively. Further, a functional in-plane p-n junction is realized side-by-side on the post-deposited SiC thin film. I-V characteristics by two probe technique showed the p-n diode characteristics. Blue light (400 nm) electroluminescence from the p-n junction on SiC thin film was observed in the forward biased condition. Further, an improvement in the I-V reverse characteristics was observed by illuminating the p-n SiC thin film with green/blue light.

Original languageEnglish
Article number48LT01
JournalJournal of Physics D: Applied Physics
Issue number48
Publication statusPublished - Sept 12 2019

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Acoustics and Ultrasonics
  • Surfaces, Coatings and Films


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