R.F. bias effect on ECR plasma

M. Murata, Y. Takeuchi, Y. Kai, M. Tanaka, Y. Kawai

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)


An electron cyclotron resonance plasma is produced with a multislot antenna, where r.f. powers (13.56 MHz) are applied to a substrate. Plasma parameters measured with a probe are examined as a function of r.f. power and pressure. It is found that when the r.f. powers are applied, negative self-bias potential appears and the plasma density tends to decrease and the plasma potential increases. Furthermore, the effect of the negative self-bias potential on the radial profile of plasma parameters is discussed.

Original languageEnglish
Pages (from-to)512-515
Number of pages4
JournalSurface and Coatings Technology
Issue numberPART 1
Publication statusPublished - Sept 1995
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry


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