TY - JOUR
T1 - Resistivity Measurements in Palladium Hydride Film Prepared by Low-Temperature Hydrogen Absorption Method
AU - Kato, Ryoma
AU - Yoshida, Ten Ichiro
AU - Iimori, Riku
AU - Zizhou, Tai
AU - Shiga, Masanobu
AU - Inagaki, Yuji
AU - Kimura, Takashi
AU - Kawae, Tatsuya
N1 - Publisher Copyright:
©2024 The Physical Society of Japan.
PY - 2024/2/15
Y1 - 2024/2/15
N2 - We investigated the superconducting properties of a palladium hydride (PdHx; x = H=Pd) film with a thickness of ∼100 nm prepared by a low-temperature hydrogen (H) absorption method. H atoms were loaded to a Pd film in H2 gas pressure of ∼0.25 MPa at temperatures of T = 180 and 150 K. At T = 180 K, after the resistivity variation due to H absorption was almost stopped, the PdHx film was cooled rapidly to low temperatures for the resistivity measurements. A superconducting transition was observed at Tc ∼ 1.1 K, where the transition width is smaller than 0.1 K. This indicates that a high-quality sample with a sharp transition can be obtained by providing sufficient time for H absorption. At T = 150 K, although the resistivity variation remained, the film was cooled. The transition temperature Tc increased to ∼2.1 K, whereas the transition width increased owing to the inhomogeneity of the H concentration in the film. Curiously, regardless of the H homogeneity, there remained a similar T-dependent residual resistivity in both films prepared at T = 180 and 150 K after the superconducting transition. This implies that the observed residual resistivity is essential for the future of the system, although its origin is not clear.
AB - We investigated the superconducting properties of a palladium hydride (PdHx; x = H=Pd) film with a thickness of ∼100 nm prepared by a low-temperature hydrogen (H) absorption method. H atoms were loaded to a Pd film in H2 gas pressure of ∼0.25 MPa at temperatures of T = 180 and 150 K. At T = 180 K, after the resistivity variation due to H absorption was almost stopped, the PdHx film was cooled rapidly to low temperatures for the resistivity measurements. A superconducting transition was observed at Tc ∼ 1.1 K, where the transition width is smaller than 0.1 K. This indicates that a high-quality sample with a sharp transition can be obtained by providing sufficient time for H absorption. At T = 150 K, although the resistivity variation remained, the film was cooled. The transition temperature Tc increased to ∼2.1 K, whereas the transition width increased owing to the inhomogeneity of the H concentration in the film. Curiously, regardless of the H homogeneity, there remained a similar T-dependent residual resistivity in both films prepared at T = 180 and 150 K after the superconducting transition. This implies that the observed residual resistivity is essential for the future of the system, although its origin is not clear.
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U2 - 10.7566/JPSJ.93.024703
DO - 10.7566/JPSJ.93.024703
M3 - Article
AN - SCOPUS:85185273634
SN - 0031-9015
VL - 93
JO - journal of the physical society of japan
JF - journal of the physical society of japan
IS - 2
M1 - 024703
ER -