TY - JOUR
T1 - Removing focused ion-beam damages on transmission electron microscopy specimens by using a plasma cleaner
AU - Hata, Satoshi
AU - Sosiati, Harini
AU - Kuwano, Noriyuki
AU - Itakura, Masaru
AU - Nakano, Takayoshi
AU - Umakoshi, Yukichi
N1 - Funding Information:
03A47002) in 2003 from New Energy and Industrial Technology Development Organization (NEDO) of Japan. This work was supported in part by Nanotechnology Support Project of the Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan.
Funding Information:
The authors thank Y. Mineno (ULVAC), S. Miyazaki (FEI) and B. Arnold (IFW Dresden) for their valuable comments. This work was partly supported by Industrial Technology Research Program (Project:
PY - 2006/1
Y1 - 2006/1
N2 - A plasma cleaner is usually used for removing carbonaceous debris from a specimen and preventing contamination during transmission electron microscopy (TEM) imaging and analysis. However, the plasma cleaner can be effectively used for thinning down damage layers on TEM specimens prepared by focused ion-beam (FIB) milling. By optimizing plasma treatment conditions, the quality of high-resolution images and diffraction patterns of the FIB-milled specimens has been remarkably improved using the plasma cleaner.
AB - A plasma cleaner is usually used for removing carbonaceous debris from a specimen and preventing contamination during transmission electron microscopy (TEM) imaging and analysis. However, the plasma cleaner can be effectively used for thinning down damage layers on TEM specimens prepared by focused ion-beam (FIB) milling. By optimizing plasma treatment conditions, the quality of high-resolution images and diffraction patterns of the FIB-milled specimens has been remarkably improved using the plasma cleaner.
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U2 - 10.1093/jmicro/dfl001
DO - 10.1093/jmicro/dfl001
M3 - Article
AN - SCOPUS:33646779889
SN - 0022-0744
VL - 55
SP - 23
EP - 26
JO - Journal of Electron Microscopy
JF - Journal of Electron Microscopy
IS - 1
ER -