Abstract
We propose a modified version of pulsed laser deposition: rapid sequential pulsed laser deposition. In this method, different metal elements are sequentially deposited onto a substrate in a fixed stoichiometric ratio in a very short period of time. This method allows a flexible choice of target material and of laser power density, which may solve the particulate problem intrinsic to a conventional laser ablation. We show results of an in situ formation of YBa2Cu3O7 thin film as a demonstration of this method.
Original language | English |
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Pages (from-to) | 1295-1297 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 64 |
Issue number | 10 |
DOIs | |
Publication status | Published - 1994 |
Externally published | Yes |
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)