Raman spectral analysis of the as-deposited a-C:H films prepared by CH4 + Ar plasma CVD

Shinjiro Ono, Sung Hwa Hwang, Takamasa Okumura, Kunihiro Kamataki, Naoto Yamashita, Naho Itagaki, Kazunori Koga, Masaharu Shiratani, Jun Seok Oh, Susumu Takabayashi, Tatsuyuki Nakatani

Research output: Contribution to journalArticlepeer-review


Applicability of precise Raman spectral analysis of a-C:H films deposited using a plasma chemical vapor deposition (CVD) method has been discussed based on the sensitivity to initial conditions in peak separation. The spectral analysis offers to deconvolute the spectra into five peaks, while the as-deposited films prepared by plasma CVD is difficult to the five-peak separation. We found the peak position and the peak height ratio of the D-band to the G+-band can be employed to discuss the structure of the as-deposited films. We examined the structural difference between the films deposited at the powered electrode and that at grounded electrode. We found graphene nanoribbon-like structures may be formed in the films deposited on the grounded substrate. This result suggests that the substrate position is an important factor to form the graphene nanoribbon-like structure. Graphical abstract: [Figure not available: see fulltext.]

Original languageEnglish
Pages (from-to)718-722
Number of pages5
JournalMRS Advances
Issue number30
Publication statusPublished - Nov 2022

All Science Journal Classification (ASJC) codes

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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