Abstract
Nano-crystalline Si films are deposited using multi-hollow plasma CVD. The films have a wide optical band gap of 1.75 eV and a large absorption coefficient similar to those of a-Si:H films. They also have a low initial defect density of 3×1015 cm3 and show high stability against light soaking. These results suggest that nano-crystalline Si films are promising materials for top cells.
| Original language | English |
|---|---|
| Title of host publication | Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4 |
| Publisher | IEEE Computer Society |
| Pages | 1664-1667 |
| Number of pages | 4 |
| ISBN (Print) | 1424400163, 9781424400164 |
| DOIs | |
| Publication status | Published - Jan 1 2006 |
| Event | 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4 - Waikoloa, HI, United States Duration: May 7 2006 → May 12 2006 |
Publication series
| Name | Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4 |
|---|---|
| Volume | 2 |
Other
| Other | 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4 |
|---|---|
| Country/Territory | United States |
| City | Waikoloa, HI |
| Period | 5/7/06 → 5/12/06 |
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
-
SDG 7 Affordable and Clean Energy
All Science Journal Classification (ASJC) codes
- Renewable Energy, Sustainability and the Environment
- Electrical and Electronic Engineering
- Electronic, Optical and Magnetic Materials
- Materials Chemistry
Fingerprint
Dive into the research topics of 'Properties of nano-crystalline silicon films for top solar cells'. Together they form a unique fingerprint.Cite this
- APA
- Standard
- Harvard
- Vancouver
- Author
- BIBTEX
- RIS