TY - JOUR
T1 - Progress and perspectives in dry processes for emerging multidisciplinary applications
T2 - How can we improve our use of dry processes?
AU - Iwase, Taku
AU - Kamaji, Yoshito
AU - Kang, Song Yun
AU - Koga, Kazunori
AU - Kuboi, Nobuyuki
AU - Nakamura, Moritaka
AU - Negishi, Nobuyuki
AU - Nozaki, Tomohiro
AU - Nunomura, Shota
AU - Ogawa, Daisuke
AU - Omura, Mitsuhiro
AU - Shimizu, Tetsuji
AU - Shinoda, Kazunori
AU - Sonoda, Yasushi
AU - Suzuki, Haruka
AU - Takahashi, Kazuo
AU - Tsutsumi, Takayoshi
AU - Yoshikawa, Kenichi
AU - Ishijima, Tatsuo
AU - Ishikawa, Kenji
N1 - Publisher Copyright:
© 2019 The Japan Society of Applied Physics.
PY - 2019
Y1 - 2019
N2 - The non-thermal nature of chemical reactions in plasma chemistry is considered to be suitable for next-generation energy production from plasma-material syntheses and renewable sources. As emerging multidisciplinary applications, plasma medicine and plasma agriculture are currently topical applications that make use of atmospheric pressure plasmas. Here, we conduct a systematic review of the literature over the last 40 years to evaluate the history and progress of dry processes with regard to atmospheric pressure plasma technologies as well as material synthesis and thin-film deposition. In this review, selected breakthroughs are reviewed. Finally, near-future major challenges are addressed to encourage new multidisciplinary research across the plasma science and technology community.
AB - The non-thermal nature of chemical reactions in plasma chemistry is considered to be suitable for next-generation energy production from plasma-material syntheses and renewable sources. As emerging multidisciplinary applications, plasma medicine and plasma agriculture are currently topical applications that make use of atmospheric pressure plasmas. Here, we conduct a systematic review of the literature over the last 40 years to evaluate the history and progress of dry processes with regard to atmospheric pressure plasma technologies as well as material synthesis and thin-film deposition. In this review, selected breakthroughs are reviewed. Finally, near-future major challenges are addressed to encourage new multidisciplinary research across the plasma science and technology community.
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U2 - 10.7567/1347-4065/ab163a
DO - 10.7567/1347-4065/ab163a
M3 - Review article
AN - SCOPUS:85072911116
SN - 0021-4922
VL - 58
JO - Japanese journal of applied physics
JF - Japanese journal of applied physics
IS - SE
M1 - SE0803
ER -