Preparation of porous and nonporous silica nanofilms from aqueous sodium silicate

Junhui He; Shigenori Fujikawa; Toyoki Kunitake; Aiko Nakao

doi:10.1021/cm034253d

Preparation of porous and nonporous silica nanofilms from aqueous sodium silicate

Junhui He, Shigenori Fujikawa, Toyoki Kunitake, Aiko Nakao

Research output: Contribution to journal › Article › peer-review

27 Citations (Scopus)

Abstract

Ultrathin SiO₂ films in the range of 2-50-nm thickness were readily fabricated from inexpensive sodium silicate as starting material by its alternate adsorption with cationic polymer and subsequent treatment with O ₂ plasma and calcination. Film thickness can be controlled by adjusting the number of adsorption cycles and the pH value of silicate solution. Film surface is generally smooth (small roughness) and remains unchanged after O₂ plasma treatment or calcination. Whereas a nanoporous thin film is obtained by O₂ plasma treatment, a dense silica film is produced through calcination at 450°C. These preparative methods prove that inexpensive sodium silicates are converted to advanced silica-based materials, such as functional ultrathin films, coatings, capsules, and catalysts, by simple procedures.

Original language	English
Pages (from-to)	3308-3313
Number of pages	6
Journal	Chemistry of Materials
Volume	15
Issue number	17
DOIs	https://doi.org/10.1021/cm034253d
Publication status	Published - Aug 2003
Externally published	Yes

All Science Journal Classification (ASJC) codes

Chemistry(all)
Chemical Engineering(all)
Materials Chemistry

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10.1021/cm034253d

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abstract = "Ultrathin SiO2 films in the range of 2-50-nm thickness were readily fabricated from inexpensive sodium silicate as starting material by its alternate adsorption with cationic polymer and subsequent treatment with O 2 plasma and calcination. Film thickness can be controlled by adjusting the number of adsorption cycles and the pH value of silicate solution. Film surface is generally smooth (small roughness) and remains unchanged after O2 plasma treatment or calcination. Whereas a nanoporous thin film is obtained by O2 plasma treatment, a dense silica film is produced through calcination at 450°C. These preparative methods prove that inexpensive sodium silicates are converted to advanced silica-based materials, such as functional ultrathin films, coatings, capsules, and catalysts, by simple procedures.",

author = "Junhui He and Shigenori Fujikawa and Toyoki Kunitake and Aiko Nakao",

year = "2003",

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T1 - Preparation of porous and nonporous silica nanofilms from aqueous sodium silicate

AU - He, Junhui

AU - Fujikawa, Shigenori

AU - Kunitake, Toyoki

AU - Nakao, Aiko

PY - 2003/8

Y1 - 2003/8

N2 - Ultrathin SiO2 films in the range of 2-50-nm thickness were readily fabricated from inexpensive sodium silicate as starting material by its alternate adsorption with cationic polymer and subsequent treatment with O 2 plasma and calcination. Film thickness can be controlled by adjusting the number of adsorption cycles and the pH value of silicate solution. Film surface is generally smooth (small roughness) and remains unchanged after O2 plasma treatment or calcination. Whereas a nanoporous thin film is obtained by O2 plasma treatment, a dense silica film is produced through calcination at 450°C. These preparative methods prove that inexpensive sodium silicates are converted to advanced silica-based materials, such as functional ultrathin films, coatings, capsules, and catalysts, by simple procedures.

AB - Ultrathin SiO2 films in the range of 2-50-nm thickness were readily fabricated from inexpensive sodium silicate as starting material by its alternate adsorption with cationic polymer and subsequent treatment with O 2 plasma and calcination. Film thickness can be controlled by adjusting the number of adsorption cycles and the pH value of silicate solution. Film surface is generally smooth (small roughness) and remains unchanged after O2 plasma treatment or calcination. Whereas a nanoporous thin film is obtained by O2 plasma treatment, a dense silica film is produced through calcination at 450°C. These preparative methods prove that inexpensive sodium silicates are converted to advanced silica-based materials, such as functional ultrathin films, coatings, capsules, and catalysts, by simple procedures.

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Preparation of porous and nonporous silica nanofilms from aqueous sodium silicate

Abstract

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