TY - JOUR
T1 - Preparation of Multielements Mixture Thin Film by One-Step Process Sputtering Deposition Using Mixture Powder Target
AU - Kawasaki, Hiroharu
AU - Ohshima, Tamiko
AU - Yagyu, Yoshihito
AU - Ihara, Takeshi
AU - Suda, Yoshiaki
N1 - Funding Information:
Manuscript received March 26, 2020; revised June 19, 2020 and September 13, 2020; accepted September 16, 2020. Date of publication September 30, 2020; date of current version January 11, 2021. This work was supported in part by the Grant-in-Aid for Scientific Research in Priority Areas (A) under Grant 18H03848 and (C) Grant 23340181 and Grant 16K04999; in part by the Kato Foundation for Promotion of Science; in part by the Center for Low-temperature Plasma Science, Nagoya University; in part by the Joint Usage/Research Center on Joining and Welding, Osaka University; in part by the Cooperation promotion center of Toyohashi University of Technology; in part by Hatakeyama Culture Foundation; and in part by the Research Institute for Applied Mechanics, Kyushu University. The review of this article was arranged by Senior Editor P. K. Chu. (Corresponding author: Hiroharu Kawasaki.) Hiroharu Kawasaki and Tamiko Ohshima are with the Electrical Engineering Department, Sasebo National College of Technology, Sasebo 8571193, Japan (e-mail: h-kawasa@sasebo.ac.jp).
Publisher Copyright:
© 1973-2012 IEEE.
PY - 2021/1
Y1 - 2021/1
N2 - Thin films consisting of a mixture of indium, gallium, zinc, and oxygen were fabricated for use as transparent conductive films for liquid crystal and/or electroluminescent displays. The thin films were produced in one step by a sputtering deposition method using mixed powder targets with different proportions of indium oxide, gallium oxide, and zinc oxide. The deposition rate of the films strongly depended on the composition of the target. X-ray photoelectron spectroscopy results revealed that mixed indium, gallium, zinc, and oxygen thin films can be prepared and their element concentration ratio is controlled by the concentration ratio of the powder target.
AB - Thin films consisting of a mixture of indium, gallium, zinc, and oxygen were fabricated for use as transparent conductive films for liquid crystal and/or electroluminescent displays. The thin films were produced in one step by a sputtering deposition method using mixed powder targets with different proportions of indium oxide, gallium oxide, and zinc oxide. The deposition rate of the films strongly depended on the composition of the target. X-ray photoelectron spectroscopy results revealed that mixed indium, gallium, zinc, and oxygen thin films can be prepared and their element concentration ratio is controlled by the concentration ratio of the powder target.
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U2 - 10.1109/TPS.2020.3025306
DO - 10.1109/TPS.2020.3025306
M3 - Article
AN - SCOPUS:85099480526
SN - 0093-3813
VL - 49
SP - 48
EP - 52
JO - IEEE Transactions on Plasma Science
JF - IEEE Transactions on Plasma Science
IS - 1
M1 - 9210009
ER -