Abstract
A lower-threshold density of atomic hydrogen (H) for nanocrystalline diamond growth in inductively coupled plasma has been examined. Vacuum-ultraviolet absorption spectroscopy was employed to measure the absolute H density in low-pressure conditions below 10.6 Pa, where nanocrystalline diamond films with grain sizes of ∼20 nm showing a distinct diamond peak in the Raman spectra were deposited. A mechanistic explanation for the growth limitation was made by comparing kinetic rates of incorporation and desorption of adsorbed methyl radicals as principal growth precursors. The results predict a threshold H density for net diamond growth of the order of 1012 cm-3.
Original language | English |
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Pages (from-to) | 251-254 |
Number of pages | 4 |
Journal | Chemical Physics Letters |
Volume | 389 |
Issue number | 4-6 |
DOIs | |
Publication status | Published - May 11 2004 |
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)
- Physical and Theoretical Chemistry