Power-law scaling of proton conductivity in amorphous silicate thin films

Yoshitaka Aoki, Hiroki Habazaki, Toyoki Kunitake

Research output: Contribution to journalArticlepeer-review


Amorphous hafnium silicate, a-Hf0.1Si0.9O x, thin film with thickness of 32, 41, 55, 80, 110, 120, 180 and 320 nm was prepared by multiple spin-cast process and the proton conductivity across the films was measured at intermediate temperatures (100-400 °C) in dry atmosphere. The morphologically- and compositionally-uniform films were prepared on a substrate as confirmed by SEM, RBS and XPS measurements. a-Hf 0.1Si0.9Ox thin film clearly revealed the H/D isotope effect on ionic conductivity, indicating that protonic conduction is dominant in the measured temperature range. The films did not reveal thickness-dependent proton conductivity in dry air and the σ at given temperatures is almost constant at any thickness. No increment of σ in a-Hf0.1Si0.9Ox thin films by reduction of thickness might be related to the absence of the highly-conductive acid network with mesoscopically-sized length because of the relatively low concentration of Brønsted acid sites inside films.

Original languageEnglish
Pages (from-to)93-96
Number of pages4
JournalSolid State Ionics
Issue number1
Publication statusPublished - Jun 16 2011
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics


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