Photolithographically constructed single ZnO nanowire device and its ultraviolet photoresponse

Quanli Liu, Takao Yasui, Kazuki Nagashima, Takeshi Yanagida, Masafumi Horiuchi, Zetao Zhu, Hiromi Takahashi, Taisuke Shimada, Akihide Arima, Yoshinobu Baba

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)


A sparse ZnO nanowire array with aspect ratio of ca. 120 and growth rate of 1 [im/h was synthesized by controlling the density of seeds at the initial stage of nanowire growth. The spatially-separated nanowires were cut off from the growth substrate without breaking, and thus were useful in the construction of a single-nanowire device by photolithography. The device exhibited a linear current-voltage characteristic associated with ohmic contact between ZnO nanowire and electrodes. The device further demonstrated a reliable photoresponse with an Luv/Idark of ~100 to ultraviolet light irradiation.

Original languageEnglish
Pages (from-to)1125-1129
Number of pages5
Journalanalytical sciences
Issue number9
Publication statusPublished - Sept 1 2020

All Science Journal Classification (ASJC) codes

  • Analytical Chemistry


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