Photoenhanced chemical vapor deposition of zinc phosphide

Yoshimine Kato, Shoichi Kurita, Toshikazu Suda

Research output: Contribution to journalArticlepeer-review

18 Citations (Scopus)


Thin films of zinc, phosphorus, and zinc phosphide (Zn3P 2) have been deposited by photodissociation of dimethylzinc (DMZ) and phosphine (PH3) on various substrates using a low-pressure mercury lamp as a light source. The substrate temperature was varied between room temperature and 250 °C. The deposition rates of the films were significantly affected by the UV light intensity, the density of gases, the PH 3/DMZ molar ratio, and the substrate temperature. Zn 3P2 microcrystallites were grown on Si(111) substrates at a temperature of 250 °C. Those crystallites were studied by using a scanning electron microscope and reflection high-energy electron diffraction. A very weak photoluminescence spectrum at 808 nm (1.53 eV) was observed at room temperature.

Original languageEnglish
Pages (from-to)3733-3739
Number of pages7
JournalJournal of Applied Physics
Issue number9
Publication statusPublished - 1987
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • General Physics and Astronomy


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