Photo-electrochemical properties of titanium dioxide thin filmsprepared by reactive RF sputtering method

Makoto Arita; Yu Tabata; Hiroki Sakamoto; Qixin Guo

doi:10.4028/www.scientific.net/MSF.750.248

Photo-electrochemical properties of titanium dioxide thin filmsprepared by reactive RF sputtering method

Makoto Arita, Yu Tabata, Hiroki Sakamoto, Qixin Guo

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

The photo-electrochemical properties of photocatalytic titanium dioxide thin filmsobtained by reactive RF magnetron sputtering were investigated. The pressure during the sputteringdeposition affected the photocatalytic activity and photo-induced hydrophilicity, and at 2 Pa thehighest activities were observed. The photocurrent under ultraviolet light illumination corresponded tothe photo-induced activities of the films. It is suggested that the band bending near the surface is oneof the most crucial factors determines the activities of photo-induced behavior of the titanium dioxidethin films.

Original language	English
Title of host publication	Advanced Materials Science and Technology
Publisher	Trans Tech Publications Ltd
Pages	248-251
Number of pages	4
ISBN (Print)	9783037856604
DOIs	https://doi.org/10.4028/www.scientific.net/MSF.750.248
Publication status	Published - 2013
Event	8th International Forum on Advanced Materials Science and Technology, IFAMST 2012 - Fukuoka City, Japan Duration: Aug 1 2012 → Aug 4 2012

Publication series

Name	Materials Science Forum
Volume	750
ISSN (Print)	0255-5476
ISSN (Electronic)	1662-9752

Other

Other	8th International Forum on Advanced Materials Science and Technology, IFAMST 2012
Country/Territory	Japan
City	Fukuoka City
Period	8/1/12 → 8/4/12

All Science Journal Classification (ASJC) codes

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

Access to Document

10.4028/www.scientific.net/MSF.750.248

Cite this

Photo-electrochemical properties of titanium dioxide thin filmsprepared by reactive RF sputtering method. / Arita, Makoto; Tabata, Yu; Sakamoto, Hiroki et al.
Advanced Materials Science and Technology. Trans Tech Publications Ltd, 2013. p. 248-251 (Materials Science Forum; Vol. 750).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Arita, M, Tabata, Y, Sakamoto, H & Guo, Q 2013, Photo-electrochemical properties of titanium dioxide thin filmsprepared by reactive RF sputtering method. in Advanced Materials Science and Technology. Materials Science Forum, vol. 750, Trans Tech Publications Ltd, pp. 248-251, 8th International Forum on Advanced Materials Science and Technology, IFAMST 2012, Fukuoka City, Japan, 8/1/12. https://doi.org/10.4028/www.scientific.net/MSF.750.248

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abstract = "The photo-electrochemical properties of photocatalytic titanium dioxide thin filmsobtained by reactive RF magnetron sputtering were investigated. The pressure during the sputteringdeposition affected the photocatalytic activity and photo-induced hydrophilicity, and at 2 Pa thehighest activities were observed. The photocurrent under ultraviolet light illumination corresponded tothe photo-induced activities of the films. It is suggested that the band bending near the surface is oneof the most crucial factors determines the activities of photo-induced behavior of the titanium dioxidethin films.",

author = "Makoto Arita and Yu Tabata and Hiroki Sakamoto and Qixin Guo",

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N2 - The photo-electrochemical properties of photocatalytic titanium dioxide thin filmsobtained by reactive RF magnetron sputtering were investigated. The pressure during the sputteringdeposition affected the photocatalytic activity and photo-induced hydrophilicity, and at 2 Pa thehighest activities were observed. The photocurrent under ultraviolet light illumination corresponded tothe photo-induced activities of the films. It is suggested that the band bending near the surface is oneof the most crucial factors determines the activities of photo-induced behavior of the titanium dioxidethin films.

AB - The photo-electrochemical properties of photocatalytic titanium dioxide thin filmsobtained by reactive RF magnetron sputtering were investigated. The pressure during the sputteringdeposition affected the photocatalytic activity and photo-induced hydrophilicity, and at 2 Pa thehighest activities were observed. The photocurrent under ultraviolet light illumination corresponded tothe photo-induced activities of the films. It is suggested that the band bending near the surface is oneof the most crucial factors determines the activities of photo-induced behavior of the titanium dioxidethin films.

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Photo-electrochemical properties of titanium dioxide thin filmsprepared by reactive RF sputtering method

Abstract

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