Particle growth kinetics in silane RF discharges

Masaharu Shiratani, Tsuyoshi Fukuzawa, Yukio Watanabe

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51 Citations (Scopus)


Growth kinetics of particles above 10 nm in size in silane RF discharges has been extensively studied and fairly well clarified. Moreover, recent developments of new measurement methods for particles below 10 nm in size have led to a rapid advance in understanding the growth processes of small particles. Such previous studies are reviewed with the accent on their initial growth phase corresponding to a particle size range below 10 nm. The notable effect of pulse modulation of the RF discharges of suppressing particle growth is also described. Both the growth of particles and their suppression by the modulation can be explained by a model taking into account the production of key radicals (highly reactive neutral radicals of SiH2 having a high production rate), particle growth reactions initiated by the key radicals and particle diffusion in the radical production region.

Original languageEnglish
Pages (from-to)4542-4549
Number of pages8
JournalJapanese Journal of Applied Physics
Issue number7 B
Publication statusPublished - Jul 1999

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)


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