Overdense Plasma Production Using Electron Cyclotron Waves

Masayoshi Tanaka, Ryuji Nishimoto, Seiichiro Higashi, Nobuhiro Harada, Takeshi Ohi, Akio Komori, Yoshinobu Kawai

Research output: Contribution to journalArticlepeer-review

60 Citations (Scopus)

Abstract

The density limit in ECR plasma production is overcome using electron cyclotron waves. The plasma of 3 x 1013 cm-3 density is achieved by parallel injection of circularly polarized microwaves with a frequency 2.45 GHz, corresponding to a 400 times higher density than ordinary mode cutoff. It is found that the plasma is produced in the high field side region between the incident position and the ECR point, and this is due to the generation of high energy electrons and the Doppler-shifted cyclotron resonance.

Original languageEnglish
Pages (from-to)1600-1607
Number of pages8
Journaljournal of the physical society of japan
Volume60
Issue number5
DOIs
Publication statusPublished - May 1991
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • General Physics and Astronomy

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