Optical thin films grown by surface chemical reaction for high-power lasers

Shin ichi Zaitsu, Shinji Motokoshi, Takahisa Jitsuno, Masahiro Nakatsuka, Tatsuhiko Yamanaka

Research output: Contribution to journalConference articlepeer-review


We prepared optical thin films grown with surface chemical reactions using TiCl4 and H2O for TiO2. The nonuniformity of thickness distribution was under 1% over 240 mm in diameter. The structure TiO2 film grown at 25 °C was amorphous. The structure changed into polycrystalline with an increase of growth temperature up to 400 °C. Secondary ion mass spectrometry showed that chloride residents presented in the films at every growth temperature. However, these chloride residents could be removed by thermal annealing at 400 °C. The TiO2 film at the growth temperature of 25 °C had a laser-induced damage threshold of 5 J/cm2 for 1-ns, 1064 nm laser pulse. The damage threshold of TiO2 films decreased at higher growth temperature. Chloride in the films had no influence on the laser-induced damage threshold.

Original languageEnglish
Pages (from-to)546-552
Number of pages7
JournalProceedings of SPIE - The International Society for Optical Engineering
Publication statusPublished - 2000
Externally publishedYes
EventAdvanced High-Power Lasers - Osaka, Jpn
Duration: Nov 1 1999Nov 5 1999

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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