Optical and structural properties of zinc-oxide thin film deposited by pulsed laser deposition

Tamiko Ohshima; Raj K. Thareja; Yukihiko Yamagata; Tomoaki Ikegami; Kenji Ebihara

doi:10.1557/proc-666-f3.20

Optical and structural properties of zinc-oxide thin film deposited by pulsed laser deposition

Tamiko Ohshima, Raj K. Thareja, Yukihiko Yamagata, Tomoaki Ikegami, Kenji Ebihara

Research output: Contribution to journal › Conference article › peer-review

2 Citations (Scopus)

Abstract

We report optical and structural properties of ZnO films deposited by pulsed laser deposition technique on silicon (100) n-type, quartz, sapphire, and coming glass substrates. We have studied the influence of the deposition parameters, such as substrate temperature, oxygen pressure, and laser fluence on the properties of the grown films. Dependence of nanocrystallites on temperature of substrate and ambient gas pressure is investigated. ZnO plasma created at varying fluence of KrF laser (248 nm) on the target was investigated using optical emission spectroscopy and 2-d images of the expanding plumes at various pressures of the ambient gas. X-ray diffraction, atomic force microscopy, electron probe micro-analyzer, and spectro-photometry were used to characterize as grown films.

Original language	English
Pages (from-to)	F3201-F3206
Journal	Materials Research Society Symposium - Proceedings
Volume	666
DOIs	https://doi.org/10.1557/proc-666-f3.20
Publication status	Published - 2001
Externally published	Yes
Event	Transport and Microstructural Phenomena in Oxide Electronics - San Francisco, CA, United States Duration: Apr 16 2001 → Apr 20 2001

All Science Journal Classification (ASJC) codes

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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@article{2fb828ddf12742609624feb08fcd858a,

title = "Optical and structural properties of zinc-oxide thin film deposited by pulsed laser deposition",

abstract = "We report optical and structural properties of ZnO films deposited by pulsed laser deposition technique on silicon (100) n-type, quartz, sapphire, and coming glass substrates. We have studied the influence of the deposition parameters, such as substrate temperature, oxygen pressure, and laser fluence on the properties of the grown films. Dependence of nanocrystallites on temperature of substrate and ambient gas pressure is investigated. ZnO plasma created at varying fluence of KrF laser (248 nm) on the target was investigated using optical emission spectroscopy and 2-d images of the expanding plumes at various pressures of the ambient gas. X-ray diffraction, atomic force microscopy, electron probe micro-analyzer, and spectro-photometry were used to characterize as grown films.",

author = "Tamiko Ohshima and Thareja, {Raj K.} and Yukihiko Yamagata and Tomoaki Ikegami and Kenji Ebihara",

year = "2001",

doi = "10.1557/proc-666-f3.20",

language = "English",

volume = "666",

pages = "F3201--F3206",

journal = "Materials Research Society Symposium - Proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

note = "Transport and Microstructural Phenomena in Oxide Electronics ; Conference date: 16-04-2001 Through 20-04-2001",

}

TY - JOUR

T1 - Optical and structural properties of zinc-oxide thin film deposited by pulsed laser deposition

AU - Ohshima, Tamiko

AU - Thareja, Raj K.

AU - Yamagata, Yukihiko

AU - Ikegami, Tomoaki

AU - Ebihara, Kenji

PY - 2001

Y1 - 2001

N2 - We report optical and structural properties of ZnO films deposited by pulsed laser deposition technique on silicon (100) n-type, quartz, sapphire, and coming glass substrates. We have studied the influence of the deposition parameters, such as substrate temperature, oxygen pressure, and laser fluence on the properties of the grown films. Dependence of nanocrystallites on temperature of substrate and ambient gas pressure is investigated. ZnO plasma created at varying fluence of KrF laser (248 nm) on the target was investigated using optical emission spectroscopy and 2-d images of the expanding plumes at various pressures of the ambient gas. X-ray diffraction, atomic force microscopy, electron probe micro-analyzer, and spectro-photometry were used to characterize as grown films.

AB - We report optical and structural properties of ZnO films deposited by pulsed laser deposition technique on silicon (100) n-type, quartz, sapphire, and coming glass substrates. We have studied the influence of the deposition parameters, such as substrate temperature, oxygen pressure, and laser fluence on the properties of the grown films. Dependence of nanocrystallites on temperature of substrate and ambient gas pressure is investigated. ZnO plasma created at varying fluence of KrF laser (248 nm) on the target was investigated using optical emission spectroscopy and 2-d images of the expanding plumes at various pressures of the ambient gas. X-ray diffraction, atomic force microscopy, electron probe micro-analyzer, and spectro-photometry were used to characterize as grown films.

UR - http://www.scopus.com/inward/record.url?scp=0035560293&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035560293&partnerID=8YFLogxK

U2 - 10.1557/proc-666-f3.20

DO - 10.1557/proc-666-f3.20

M3 - Conference article

AN - SCOPUS:0035560293

SN - 0272-9172

VL - 666

SP - F3201-F3206

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

T2 - Transport and Microstructural Phenomena in Oxide Electronics

Y2 - 16 April 2001 through 20 April 2001

ER -

Optical and structural properties of zinc-oxide thin film deposited by pulsed laser deposition

Abstract

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