TY - JOUR
T1 - On-Chip Millimeter-Wave DGS Based Bandstop Filter in 0.18-μm CMOS Process
AU - Thapa, Samundra K.
AU - Pokharel, Ramesh K.
AU - Chen, Baichuan
AU - Barakat, Adel
N1 - Publisher Copyright:
© 2004-2012 IEEE.
PY - 2022/6/1
Y1 - 2022/6/1
N2 - Defected Ground Structure (DGS) based on-chip bandstop filter (BSF) design is proposed for millimeter-wave applications. In the proposed structure, a capacitively loaded T-shape resonator is embedded in the original DGS resonator, which forms two high quality ( ${Q}$ -) factor small loop resonators. Moreover, this structure, in combination with the feedline and series capacitor, independently realizes the position of two transmission poles: one at each side of the parallel resonance without increasing the layout size. The proposed BSF presents a sharp scattering (S-) parameter response due to the appearance of two transmission poles. As a result, the loaded ${Q}$ -factor and negative group delay of the BSF are improved. The prototype of the proposed BSF is fabricated in 0.18- $\mu \text{m}$ Complementary Metal-Oxide-Semiconductor (CMOS) process and measured. The measurement result shows a return loss of 1.78 dB at 53.2 GHz center stopband frequency with the negative group delay of 161 pS. The measurement results also agree well with the electromagnetic simulation results. Without pads, the active area of the prototyped BSF is only 0.024 mm2.
AB - Defected Ground Structure (DGS) based on-chip bandstop filter (BSF) design is proposed for millimeter-wave applications. In the proposed structure, a capacitively loaded T-shape resonator is embedded in the original DGS resonator, which forms two high quality ( ${Q}$ -) factor small loop resonators. Moreover, this structure, in combination with the feedline and series capacitor, independently realizes the position of two transmission poles: one at each side of the parallel resonance without increasing the layout size. The proposed BSF presents a sharp scattering (S-) parameter response due to the appearance of two transmission poles. As a result, the loaded ${Q}$ -factor and negative group delay of the BSF are improved. The prototype of the proposed BSF is fabricated in 0.18- $\mu \text{m}$ Complementary Metal-Oxide-Semiconductor (CMOS) process and measured. The measurement result shows a return loss of 1.78 dB at 53.2 GHz center stopband frequency with the negative group delay of 161 pS. The measurement results also agree well with the electromagnetic simulation results. Without pads, the active area of the prototyped BSF is only 0.024 mm2.
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U2 - 10.1109/TCSII.2022.3158995
DO - 10.1109/TCSII.2022.3158995
M3 - Article
AN - SCOPUS:85126519411
SN - 1549-7747
VL - 69
SP - 2732
EP - 2736
JO - IEEE Transactions on Circuits and Systems II: Express Briefs
JF - IEEE Transactions on Circuits and Systems II: Express Briefs
IS - 6
ER -