Observation of SiO2 Nanoparticle Formation via UV Pulsed Laser Ablation in a Background Gas

Reiji Koike, Rio Suzuki, Keita Katayama, Mitsuhiro Higashihata, Hiroshi Ikenoue, Daisuke Nakamura

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)


SiO2 nanoporous films have recently gained significant popularity as low-k dielectric constant insulating films. In this study, we demonstrated the fabrication of a low-k SiO2 nanoporous film consisting of SiO2 nanoparticles by pulsed laser deposition. However, to optimize the growth conditions of nanoporous films, it is important to understand the spatial and size distribution of nanoparticles produced by laser ablation. Here, we visualized laser-ablated SiO2 nanoparticles using a two-dimensional laser scattering imaging technique and investigated the influence of gas species and pressure on the spatial distribution of the nanoparticles in the gas phase. After the decay of the plasma emission within several microseconds, a spherical-shaped scattering image depicting the spatial distribution of SiO2 nanoparticles was obtained from a delay time of approximately 10 ms. In Ar gas, the sphericalshaped distribution of SiO2 nanoparticles changed to an ellipsoidal shape with increasing pressure, whereas in O2 gas, it changed a mushroom-like shape.

Original languageEnglish
Pages (from-to)185-188
Number of pages4
JournalJournal of Laser Micro Nanoengineering
Issue number3
Publication statusPublished - 2021

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering


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