Numerical analysis of oxygen induction thermal plasmas with chemically non-equilibrium assumption for dissociation and ionization

Takayuki Watanabe; Noriaki Sugimoto

doi:10.1016/j.tsf.2003.12.022

Numerical analysis of oxygen induction thermal plasmas with chemically non-equilibrium assumption for dissociation and ionization

Takayuki Watanabe, Noriaki Sugimoto

Research output: Contribution to journal › Conference article › peer-review

22 Citations (Scopus)

Abstract

Modeling of induction thermal plasmas has been performed to investigate a chemically non-equilibrium effect for dissociation and ionization. Computations were carried out for oxygen plasmas under atmospheric pressure. The thermofluid and concentration fields were obtained by solving of two-dimensional modeling. This formulation was presented using higher-order approximation of the Chapman-Enskog method for the estimation of transport properties. A deviation from the equilibrium model indicates that oxygen induction plasmas should be treated as non-equilibrium for dissociation and ionization. The present modeling would give the guidance for the rational design of new material processing using thermal plasmas.

Original language	English
Pages (from-to)	201-208
Number of pages	8
Journal	Thin Solid Films
Volume	457
Issue number	1
DOIs	https://doi.org/10.1016/j.tsf.2003.12.022
Publication status	Published - Jun 1 2004
Externally published	Yes
Event	16th Symposium on Plasma Science for Materials (SPSM-16) - Tokyo, Japan Duration: Jun 4 2003 → Jun 5 2003

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/j.tsf.2003.12.022

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abstract = "Modeling of induction thermal plasmas has been performed to investigate a chemically non-equilibrium effect for dissociation and ionization. Computations were carried out for oxygen plasmas under atmospheric pressure. The thermofluid and concentration fields were obtained by solving of two-dimensional modeling. This formulation was presented using higher-order approximation of the Chapman-Enskog method for the estimation of transport properties. A deviation from the equilibrium model indicates that oxygen induction plasmas should be treated as non-equilibrium for dissociation and ionization. The present modeling would give the guidance for the rational design of new material processing using thermal plasmas.",

author = "Takayuki Watanabe and Noriaki Sugimoto",

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T1 - Numerical analysis of oxygen induction thermal plasmas with chemically non-equilibrium assumption for dissociation and ionization

AU - Watanabe, Takayuki

AU - Sugimoto, Noriaki

PY - 2004/6/1

Y1 - 2004/6/1

N2 - Modeling of induction thermal plasmas has been performed to investigate a chemically non-equilibrium effect for dissociation and ionization. Computations were carried out for oxygen plasmas under atmospheric pressure. The thermofluid and concentration fields were obtained by solving of two-dimensional modeling. This formulation was presented using higher-order approximation of the Chapman-Enskog method for the estimation of transport properties. A deviation from the equilibrium model indicates that oxygen induction plasmas should be treated as non-equilibrium for dissociation and ionization. The present modeling would give the guidance for the rational design of new material processing using thermal plasmas.

AB - Modeling of induction thermal plasmas has been performed to investigate a chemically non-equilibrium effect for dissociation and ionization. Computations were carried out for oxygen plasmas under atmospheric pressure. The thermofluid and concentration fields were obtained by solving of two-dimensional modeling. This formulation was presented using higher-order approximation of the Chapman-Enskog method for the estimation of transport properties. A deviation from the equilibrium model indicates that oxygen induction plasmas should be treated as non-equilibrium for dissociation and ionization. The present modeling would give the guidance for the rational design of new material processing using thermal plasmas.

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DO - 10.1016/j.tsf.2003.12.022

M3 - Conference article

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SN - 0040-6090

VL - 457

SP - 201

EP - 208

JO - Thin Solid Films

JF - Thin Solid Films

IS - 1

T2 - 16th Symposium on Plasma Science for Materials (SPSM-16)

Y2 - 4 June 2003 through 5 June 2003

ER -

Numerical analysis of oxygen induction thermal plasmas with chemically non-equilibrium assumption for dissociation and ionization

Abstract

All Science Journal Classification (ASJC) codes

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