TY - JOUR
T1 - Near-edge X-ray absorption fine-structure spectroscopic study on nitrogen-doped ultrananocrystalline diamond/hydrogenated amorphous carbon composite films prepared by pulsed laser deposition
AU - Al-Riyami, Sausan
AU - Ohmagari, Shinya
AU - Yoshitake, Tsuyoshi
PY - 2011/8
Y1 - 2011/8
N2 - Nitrogen-doped ultrananocrystalline diamond (UNCD)/hydrogenated amorphous carbon (a-C:H) composite films, which possessed n-type conduction with enhanced electrical conductivity, were prepared by pulsed laser deposition. The film doped with a nitrogen content of 7.9 at. % possessed enhanced electrical conductivity of 18Ω-1·cm-1 at 300 K. The near-edge X-ray absorption fine-structure (NEXAFS) measurement indicated the appearance of additional peaks due to π* C=N, σ* C=N, and σ*C-N bonds compared with the spectra of undoped films. The sp2 bonding fraction estimated from the NEXAFS spectra increased with the nitrogen content. The enhanced electrical conductivity is probably due to the formation of additional π* and σ* states and the enhancement in the sp2 bonding fraction.
AB - Nitrogen-doped ultrananocrystalline diamond (UNCD)/hydrogenated amorphous carbon (a-C:H) composite films, which possessed n-type conduction with enhanced electrical conductivity, were prepared by pulsed laser deposition. The film doped with a nitrogen content of 7.9 at. % possessed enhanced electrical conductivity of 18Ω-1·cm-1 at 300 K. The near-edge X-ray absorption fine-structure (NEXAFS) measurement indicated the appearance of additional peaks due to π* C=N, σ* C=N, and σ*C-N bonds compared with the spectra of undoped films. The sp2 bonding fraction estimated from the NEXAFS spectra increased with the nitrogen content. The enhanced electrical conductivity is probably due to the formation of additional π* and σ* states and the enhancement in the sp2 bonding fraction.
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U2 - 10.1143/JJAP.50.08JD05
DO - 10.1143/JJAP.50.08JD05
M3 - Article
AN - SCOPUS:80051964739
SN - 0021-4922
VL - 50
JO - Japanese journal of applied physics
JF - Japanese journal of applied physics
IS - 8 PART 2
M1 - 08JD05
ER -