Nanocrystalline diamond film prepared by pulsed laser deposition in a hydrogen atmosphere

Takeshi Hara; Tsuyoshi Yoshitake; Tomohito Fukugawa; Ling yun Zhu; Masaru Itakura; Noriyuki Kuwano; Yoshitsugu Tomokiyo; Kunihito Nagayama

doi:10.1016/j.diamond.2003.10.055

Nanocrystalline diamond film prepared by pulsed laser deposition in a hydrogen atmosphere

Takeshi Hara, Tsuyoshi Yoshitake, Tomohito Fukugawa, Ling yun Zhu, Masaru Itakura, Noriyuki Kuwano, Yoshitsugu Tomokiyo, Kunihito Nagayama

Materials Physics and Engineering

Research output: Contribution to journal › Article › peer-review

11 Citations (Scopus)

Abstract

Nanocrystalline diamond films were grown in a hydrogen atmosphere by pulsed laser deposition (PLD). The transmission electron microscopy indicated the presence of non-oriented nanocrystalline diamond films, with crystallite diameters 10-20 nm, grown at an optimum hydrogen pressure of 4 Torr. A small amount of amorphous carbon was observed to have remained in the film. The typical deposition rate was 80 nm/min. The substrate temperature for the growth was 550 °C, which is lower by 150 °C than that of the conventional chemical vapor deposition. The deposited film had a smooth surface on the nanoscale.

Original language	English
Pages (from-to)	679-683
Number of pages	5
Journal	Diamond and Related Materials
Volume	13
Issue number	4-8
DOIs	https://doi.org/10.1016/j.diamond.2003.10.055
Publication status	Published - Apr 2004

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Chemistry(all)
Mechanical Engineering
Materials Chemistry
Electrical and Electronic Engineering

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10.1016/j.diamond.2003.10.055

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title = "Nanocrystalline diamond film prepared by pulsed laser deposition in a hydrogen atmosphere",

abstract = "Nanocrystalline diamond films were grown in a hydrogen atmosphere by pulsed laser deposition (PLD). The transmission electron microscopy indicated the presence of non-oriented nanocrystalline diamond films, with crystallite diameters 10-20 nm, grown at an optimum hydrogen pressure of 4 Torr. A small amount of amorphous carbon was observed to have remained in the film. The typical deposition rate was 80 nm/min. The substrate temperature for the growth was 550 °C, which is lower by 150 °C than that of the conventional chemical vapor deposition. The deposited film had a smooth surface on the nanoscale.",

author = "Takeshi Hara and Tsuyoshi Yoshitake and Tomohito Fukugawa and Zhu, {Ling yun} and Masaru Itakura and Noriyuki Kuwano and Yoshitsugu Tomokiyo and Kunihito Nagayama",

year = "2004",

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doi = "10.1016/j.diamond.2003.10.055",

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T1 - Nanocrystalline diamond film prepared by pulsed laser deposition in a hydrogen atmosphere

AU - Hara, Takeshi

AU - Yoshitake, Tsuyoshi

AU - Fukugawa, Tomohito

AU - Zhu, Ling yun

AU - Itakura, Masaru

AU - Kuwano, Noriyuki

AU - Tomokiyo, Yoshitsugu

AU - Nagayama, Kunihito

PY - 2004/4

Y1 - 2004/4

N2 - Nanocrystalline diamond films were grown in a hydrogen atmosphere by pulsed laser deposition (PLD). The transmission electron microscopy indicated the presence of non-oriented nanocrystalline diamond films, with crystallite diameters 10-20 nm, grown at an optimum hydrogen pressure of 4 Torr. A small amount of amorphous carbon was observed to have remained in the film. The typical deposition rate was 80 nm/min. The substrate temperature for the growth was 550 °C, which is lower by 150 °C than that of the conventional chemical vapor deposition. The deposited film had a smooth surface on the nanoscale.

AB - Nanocrystalline diamond films were grown in a hydrogen atmosphere by pulsed laser deposition (PLD). The transmission electron microscopy indicated the presence of non-oriented nanocrystalline diamond films, with crystallite diameters 10-20 nm, grown at an optimum hydrogen pressure of 4 Torr. A small amount of amorphous carbon was observed to have remained in the film. The typical deposition rate was 80 nm/min. The substrate temperature for the growth was 550 °C, which is lower by 150 °C than that of the conventional chemical vapor deposition. The deposited film had a smooth surface on the nanoscale.

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EP - 683

JO - Diamond and Related Materials

JF - Diamond and Related Materials

IS - 4-8

ER -

Nanocrystalline diamond film prepared by pulsed laser deposition in a hydrogen atmosphere

Abstract

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