Microspot photoemission spectrometer based on FS-VUV radiation

T. Munakata, T. Masuda, N. Ueno, S. Sakaya, T. Sugiyama, N. Takehiro, Y. Sonoda

Research output: Contribution to journalConference articlepeer-review

20 Citations (Scopus)


The lateral resolution of our laser-based microspot photoemission spectrometer [Surf. Sci. 507-510 (2002) 434] has been improved to 0.3 μm by focusing VUV light of 140 nm wavelength (8.9 eV photon energy). The VUV light is generated by frequency tripling a second-harmonic output of a regeneratively amplified titanium:sapphire laser of 250 kHz repetition rate, and is focused on a sample surface by a Schwarzschild objective of 0.29 NA. Time-of-flight (TOF) photoelectron spectra of energy resolution better than 40 meV are accumulated for 0.4 s during scanning the sample position by 0.1 μm/step. Measurement on a Ta-striped Si sample revealed that the lateral resolution is 0.3 μm, which is very close to the diffraction-limited spot diameter. The present microspectrometer is characterized with the simultaneous realization of the diffraction-limited lateral resolution and the high-energy resolution, which is close to the Fourier transform of the pulse width of the laser light (100 fs).

Original languageEnglish
Pages (from-to)1140-1144
Number of pages5
JournalSurface Science
Publication statusPublished - Jun 10 2003
Externally publishedYes
EventProceedings of the 7th International Conference on Nanometer - Malmo, Sweden
Duration: Aug 29 2002Aug 31 2002

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry


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