Magnetoresistance behavior in microfabricated trilayer strip pattern

K. Matsuyama; H. Asada; S. Ikeda; I. Chida

doi:10.1016/0304-8853(95)00876-4

Magnetoresistance behavior in microfabricated trilayer strip pattern

K. Matsuyama, H. Asada, S. Ikeda, I. Chida

Electronic Devices

Research output: Contribution to journal › Conference article › peer-review

1 Citation (Scopus)

Abstract

This paper reports a highly sensitive GMR behavior observed in a microstructured Ni₇₈Fe₂₂/Cu/Co trilayer strip pattern deposited by the electron beam evaporation method. The MR ratio of 3.2% for an applied field of 20 Oe was obtained at room temperature. The superior selective switching of the magnetizations in the two magnetic layers has been confirmed by the MR behavior in a rotating magnetic field.

Original language	English
Pages (from-to)	301-302
Number of pages	2
Journal	Journal of Magnetism and Magnetic Materials
Volume	156
Issue number	1-3
DOIs	https://doi.org/10.1016/0304-8853(95)00876-4
Publication status	Published - 1996
Event	Proceedings of the 1995 2nd International Symposium on Metallic Multilayers, MML - Cambridge, UK Duration: Sept 11 1995 → Sept 14 1995

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics

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10.1016/0304-8853(95)00876-4

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@article{94cc64a198864bbba983d69a77a59c14,

title = "Magnetoresistance behavior in microfabricated trilayer strip pattern",

abstract = "This paper reports a highly sensitive GMR behavior observed in a microstructured Ni78Fe22/Cu/Co trilayer strip pattern deposited by the electron beam evaporation method. The MR ratio of 3.2% for an applied field of 20 Oe was obtained at room temperature. The superior selective switching of the magnetizations in the two magnetic layers has been confirmed by the MR behavior in a rotating magnetic field.",

author = "K. Matsuyama and H. Asada and S. Ikeda and I. Chida",

year = "1996",

doi = "10.1016/0304-8853(95)00876-4",

language = "English",

volume = "156",

pages = "301--302",

journal = "Journal of Magnetism and Magnetic Materials",

issn = "0304-8853",

publisher = "Elsevier",

number = "1-3",

note = "Proceedings of the 1995 2nd International Symposium on Metallic Multilayers, MML ; Conference date: 11-09-1995 Through 14-09-1995",

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TY - JOUR

T1 - Magnetoresistance behavior in microfabricated trilayer strip pattern

AU - Matsuyama, K.

AU - Asada, H.

AU - Ikeda, S.

AU - Chida, I.

PY - 1996

Y1 - 1996

N2 - This paper reports a highly sensitive GMR behavior observed in a microstructured Ni78Fe22/Cu/Co trilayer strip pattern deposited by the electron beam evaporation method. The MR ratio of 3.2% for an applied field of 20 Oe was obtained at room temperature. The superior selective switching of the magnetizations in the two magnetic layers has been confirmed by the MR behavior in a rotating magnetic field.

AB - This paper reports a highly sensitive GMR behavior observed in a microstructured Ni78Fe22/Cu/Co trilayer strip pattern deposited by the electron beam evaporation method. The MR ratio of 3.2% for an applied field of 20 Oe was obtained at room temperature. The superior selective switching of the magnetizations in the two magnetic layers has been confirmed by the MR behavior in a rotating magnetic field.

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U2 - 10.1016/0304-8853(95)00876-4

DO - 10.1016/0304-8853(95)00876-4

M3 - Conference article

AN - SCOPUS:0030122980

SN - 0304-8853

VL - 156

SP - 301

EP - 302

JO - Journal of Magnetism and Magnetic Materials

JF - Journal of Magnetism and Magnetic Materials

IS - 1-3

T2 - Proceedings of the 1995 2nd International Symposium on Metallic Multilayers, MML

Y2 - 11 September 1995 through 14 September 1995

ER -

Magnetoresistance behavior in microfabricated trilayer strip pattern

Abstract

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