TY - GEN
T1 - Magnetic Recording on the RE-TM /Pt Magnetic Wire Deposited on Nano-Imprinted Plastic Substrate
AU - Awano, Hiroyuki
AU - Sumi, Satoshi
AU - Kurokawa, Yuichiro
AU - Bang, Do
AU - Moribayashi, Akihiko
AU - Yoshimura, Ryogo
AU - Asari, Tsukasa
N1 - Funding Information:
New magnetic wire fabrication method using nano-imprint technique with plastic substrate has been proposed. By using this method, uniform and smooth magnetic wires of very narrow patterns of 45nm in width can be fabricated. Moreover, uniform magnetic domains can be recorded on it by using magnetic head, and confirmed the uniform recording image by using a scanning TMR head. IV. REFERENCES [1] D-T Ngo, K. Ikeda, and H. Awano, “Direct observation of domain wall induced by low-current density in TbFeCo wires”, Appl. Phys. Express, vol. 4, 093002 (2011). [2] Do Bang, and Hiroyuki Awano, “Current-induced domain wall motion in perpendicular magnetizied TbFeCo wire with different interface structure,” Appl. Phys. Express, vol. 5, 125201 (2012). [3] Do Bang, and Hiroyuki Awano, “Field-and Current-Induced Domain Wall Motion in Tb/Co Multilayers in the Presence of Spin-Orbit Coupling-Induced Torques,” IEEE Trans. Magn., vol. 50, No. 11, p. 1401704, (2014). [4] Hiroyuki Awano, “Investigation of domain wall motion in RE-TM magnetic wire towards a current driven memory and logic,” J. Magn. Magn. Mater., vol. 383, pp. 50-51, (2015). V. ACKNOWLEDGEMENTS This work was partly supported by the Strategic Infrastructure Project of the Ministry of Education, Culture, Sports, Science and Technology, Japan, and JSPS KAKENHI Grannt Number 24360126, and 26630137.
Publisher Copyright:
© 2016 IEEE.
PY - 2018/10/2
Y1 - 2018/10/2
N2 - Magnetic wire memory is attractive for future ultra-low power consumption data storage. To prepare the magnetic wire, most of the research group are using a dry etching or lift-off method. However, the process makes several damages to the sample. Therefore, we have proposed a new fabrication technique of the magnetic wire without the etching process. It can be realize by using nano-imprint method on a plastic substrate. The wire edge is very smooth compared with that of the magnetic wire made by lift-off method. Therefore, the critical current density for domain wall motion of the nano-imprinted magnetic wire can be reduced down to one-tenth compared with that made by lift-off method. And also, using this method, very narrow TbFeCo magnetic wire of 45nm in width can be fabricated and uniform magnetic domain patterns are recorded on it.
AB - Magnetic wire memory is attractive for future ultra-low power consumption data storage. To prepare the magnetic wire, most of the research group are using a dry etching or lift-off method. However, the process makes several damages to the sample. Therefore, we have proposed a new fabrication technique of the magnetic wire without the etching process. It can be realize by using nano-imprint method on a plastic substrate. The wire edge is very smooth compared with that of the magnetic wire made by lift-off method. Therefore, the critical current density for domain wall motion of the nano-imprinted magnetic wire can be reduced down to one-tenth compared with that made by lift-off method. And also, using this method, very narrow TbFeCo magnetic wire of 45nm in width can be fabricated and uniform magnetic domain patterns are recorded on it.
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U2 - 10.1109/ICAUMS.2016.8479813
DO - 10.1109/ICAUMS.2016.8479813
M3 - Conference contribution
AN - SCOPUS:85056407059
T3 - 2016 International Conference of Asian Union of Magnetics Societies, ICAUMS 2016
BT - 2016 International Conference of Asian Union of Magnetics Societies, ICAUMS 2016
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 2016 International Conference of Asian Union of Magnetics Societies, ICAUMS 2016
Y2 - 1 August 2016 through 5 August 2016
ER -