Magnetic and Electric Properties of Fe3O4 Thin Films Sputtered on Metallic Underlayer

Fei Qin; Yukio Nozaki; Kimihide Matsuyama

Magnetic and Electric Properties of Fe3O4 Thin Films Sputtered on Metallic Underlayer

Fei Qin, Yukio Nozaki, Kimihide Matsuyama

Electronic Devices

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Abstract

High-quality Fe₃O₄ thin films have been fabricated onto metallic underlayers of Cr/Cu and Al by rf-magnetron sputtering at low substrate temperatures (< 573 K). The measured saturation magnetizations M_s are 462 emu/cm³ for Al (50 nm)/Fe₃O ₄ (200 nm) and 422 emu/cm³ for Cr (45nm)/Cu (300nm)/Fe₃O₄ (200nm), which are markedly enhanced compared with that for the reference sample deposited directly on a glass substrate, and practically comparable to the bulk value of 477emu/cm ³. Highly conductive transport with an order-disorder change of the Verwey transition was observed in the current-perpendicular-to-plane geometry. The order of decrease in coercive field was achieved by exchange coupling with an overlaid NiFe layer.

Original language	English
Pages (from-to)	189-192
Number of pages	4
Journal	IEICE Transactions on Electronics
Volume	E87-C
Issue number	2
Publication status	Published - Feb 2004

All Science Journal Classification (ASJC) codes

Electrical and Electronic Engineering

Cite this

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title = "Magnetic and Electric Properties of Fe3O4 Thin Films Sputtered on Metallic Underlayer",

abstract = "High-quality Fe3O4 thin films have been fabricated onto metallic underlayers of Cr/Cu and Al by rf-magnetron sputtering at low substrate temperatures (< 573 K). The measured saturation magnetizations Ms are 462 emu/cm3 for Al (50 nm)/Fe3O 4 (200 nm) and 422 emu/cm3 for Cr (45nm)/Cu (300nm)/Fe3O4 (200nm), which are markedly enhanced compared with that for the reference sample deposited directly on a glass substrate, and practically comparable to the bulk value of 477emu/cm 3. Highly conductive transport with an order-disorder change of the Verwey transition was observed in the current-perpendicular-to-plane geometry. The order of decrease in coercive field was achieved by exchange coupling with an overlaid NiFe layer.",

author = "Fei Qin and Yukio Nozaki and Kimihide Matsuyama",

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language = "English",

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journal = "IEICE Transactions on Electronics",

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T1 - Magnetic and Electric Properties of Fe3O4 Thin Films Sputtered on Metallic Underlayer

AU - Qin, Fei

AU - Nozaki, Yukio

AU - Matsuyama, Kimihide

PY - 2004/2

Y1 - 2004/2

N2 - High-quality Fe3O4 thin films have been fabricated onto metallic underlayers of Cr/Cu and Al by rf-magnetron sputtering at low substrate temperatures (< 573 K). The measured saturation magnetizations Ms are 462 emu/cm3 for Al (50 nm)/Fe3O 4 (200 nm) and 422 emu/cm3 for Cr (45nm)/Cu (300nm)/Fe3O4 (200nm), which are markedly enhanced compared with that for the reference sample deposited directly on a glass substrate, and practically comparable to the bulk value of 477emu/cm 3. Highly conductive transport with an order-disorder change of the Verwey transition was observed in the current-perpendicular-to-plane geometry. The order of decrease in coercive field was achieved by exchange coupling with an overlaid NiFe layer.

AB - High-quality Fe3O4 thin films have been fabricated onto metallic underlayers of Cr/Cu and Al by rf-magnetron sputtering at low substrate temperatures (< 573 K). The measured saturation magnetizations Ms are 462 emu/cm3 for Al (50 nm)/Fe3O 4 (200 nm) and 422 emu/cm3 for Cr (45nm)/Cu (300nm)/Fe3O4 (200nm), which are markedly enhanced compared with that for the reference sample deposited directly on a glass substrate, and practically comparable to the bulk value of 477emu/cm 3. Highly conductive transport with an order-disorder change of the Verwey transition was observed in the current-perpendicular-to-plane geometry. The order of decrease in coercive field was achieved by exchange coupling with an overlaid NiFe layer.

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Magnetic and Electric Properties of Fe3O4 Thin Films Sputtered on Metallic Underlayer

Abstract

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