Low loss SOI-based high-mesa waveguides fabricated using neutral loop discharge (NLD) plasma etching for compact breath-sensing system

Satoshi Yano; Kosuke Kameyama; Kiichi Hamamoto

doi:10.1364/ipnra.2007.iwa7

Low loss SOI-based high-mesa waveguides fabricated using neutral loop discharge (NLD) plasma etching for compact breath-sensing system

Satoshi Yano, Kosuke Kameyama, Kiichi Hamamoto

Electrical Engineering Sciences

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Citation (Scopus)

Abstract

SOI-based Si/SiO₂ high-mesa waveguide has been fabricated by using neutral loop discharge (NLD) plasma etching. Significant loss reduction of about 50%, resulted in 0.3dB/cm propagation loss, has been achieved.

Original language	English
Title of host publication	Integrated Photonics and Nanophotonics Research and Applications, IPNRA 2007
Publisher	Optical Society of America (OSA)
ISBN (Print)	1557528446, 9781557528445
DOIs	https://doi.org/10.1364/ipnra.2007.iwa7
Publication status	Published - 2007
Event	Integrated Photonics and Nanophotonics Research and Applications, IPNRA 2007 - Salt Lake City, UT, United States Duration: Jul 8 2007 → Jul 8 2007

Publication series

Name	Optics InfoBase Conference Papers
ISSN (Electronic)	2162-2701

Other

Other	Integrated Photonics and Nanophotonics Research and Applications, IPNRA 2007
Country/Territory	United States
City	Salt Lake City, UT
Period	7/8/07 → 7/8/07

All Science Journal Classification (ASJC) codes

Instrumentation
Atomic and Molecular Physics, and Optics

Access to Document

10.1364/ipnra.2007.iwa7

Cite this

Yano, S., Kameyama, K., & Hamamoto, K. (2007). Low loss SOI-based high-mesa waveguides fabricated using neutral loop discharge (NLD) plasma etching for compact breath-sensing system. In Integrated Photonics and Nanophotonics Research and Applications, IPNRA 2007 (Optics InfoBase Conference Papers). Optical Society of America (OSA). https://doi.org/10.1364/ipnra.2007.iwa7

Low loss SOI-based high-mesa waveguides fabricated using neutral loop discharge (NLD) plasma etching for compact breath-sensing system. / Yano, Satoshi; Kameyama, Kosuke; Hamamoto, Kiichi.
Integrated Photonics and Nanophotonics Research and Applications, IPNRA 2007. Optical Society of America (OSA), 2007. (Optics InfoBase Conference Papers).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Yano, S, Kameyama, K & Hamamoto, K 2007, Low loss SOI-based high-mesa waveguides fabricated using neutral loop discharge (NLD) plasma etching for compact breath-sensing system. in Integrated Photonics and Nanophotonics Research and Applications, IPNRA 2007. Optics InfoBase Conference Papers, Optical Society of America (OSA), Integrated Photonics and Nanophotonics Research and Applications, IPNRA 2007, Salt Lake City, UT, United States, 7/8/07. https://doi.org/10.1364/ipnra.2007.iwa7

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title = "Low loss SOI-based high-mesa waveguides fabricated using neutral loop discharge (NLD) plasma etching for compact breath-sensing system",

abstract = "SOI-based Si/SiO2 high-mesa waveguide has been fabricated by using neutral loop discharge (NLD) plasma etching. Significant loss reduction of about 50%, resulted in 0.3dB/cm propagation loss, has been achieved.",

author = "Satoshi Yano and Kosuke Kameyama and Kiichi Hamamoto",

year = "2007",

doi = "10.1364/ipnra.2007.iwa7",

language = "English",

isbn = "1557528446",

series = "Optics InfoBase Conference Papers",

publisher = "Optical Society of America (OSA)",

booktitle = "Integrated Photonics and Nanophotonics Research and Applications, IPNRA 2007",

note = "Integrated Photonics and Nanophotonics Research and Applications, IPNRA 2007 ; Conference date: 08-07-2007 Through 08-07-2007",

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PY - 2007

Y1 - 2007

N2 - SOI-based Si/SiO2 high-mesa waveguide has been fabricated by using neutral loop discharge (NLD) plasma etching. Significant loss reduction of about 50%, resulted in 0.3dB/cm propagation loss, has been achieved.

AB - SOI-based Si/SiO2 high-mesa waveguide has been fabricated by using neutral loop discharge (NLD) plasma etching. Significant loss reduction of about 50%, resulted in 0.3dB/cm propagation loss, has been achieved.

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U2 - 10.1364/ipnra.2007.iwa7

DO - 10.1364/ipnra.2007.iwa7

M3 - Conference contribution

AN - SCOPUS:85085841442

SN - 1557528446

SN - 9781557528445

T3 - Optics InfoBase Conference Papers

BT - Integrated Photonics and Nanophotonics Research and Applications, IPNRA 2007

PB - Optical Society of America (OSA)

T2 - Integrated Photonics and Nanophotonics Research and Applications, IPNRA 2007

Y2 - 8 July 2007 through 8 July 2007

ER -

Low loss SOI-based high-mesa waveguides fabricated using neutral loop discharge (NLD) plasma etching for compact breath-sensing system

Abstract

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Other

All Science Journal Classification (ASJC) codes

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