Lithium niobate-tantalate thin films on Si by thermal plasma spray CVD

S. A. Kulinich; H. Yamamoto; J. Shibata; K. Terashima; T. Yoshida

doi:10.1016/S0040-6090(02)00013-5

Lithium niobate-tantalate thin films on Si by thermal plasma spray CVD

S. A. Kulinich, H. Yamamoto, J. Shibata, K. Terashima, T. Yoshida

Research output: Contribution to journal › Conference article › peer-review

10 Citations (Scopus)

Abstract

Highly (0 0 6)-oriented lithium niobate-tantalate (LiNb_0.5Ta_0.5O₃ and LiNb_0.2Ta_0.8O₃) thin films with submicron thickness were prepared by thermal plasma spray CVD on Si(1 0 0) substrates covered with a native oxide layer. The effect of the growth rate on film orientation and surface morphology has been studied. It was shown that both growth temperature and growth rate are responsible for producing highly (0 0 6)-textured films. The films do not exhibit any effect of the Nb/Ta ratio on their orientation.

Original language	English
Pages (from-to)	60-66
Number of pages	7
Journal	Thin Solid Films
Volume	407
Issue number	1-2
DOIs	https://doi.org/10.1016/S0040-6090(02)00013-5
Publication status	Published - Mar 22 2002
Externally published	Yes
Event	Proceedinggs of the 14th Symposium on Plasma Science for Marteri (SPSM-14) - Tokyo, Japan Duration: Jun 13 2001 → Jun 14 2001

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/S0040-6090(02)00013-5

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title = "Lithium niobate-tantalate thin films on Si by thermal plasma spray CVD",

abstract = "Highly (0 0 6)-oriented lithium niobate-tantalate (LiNb0.5Ta0.5O3 and LiNb0.2Ta0.8O3) thin films with submicron thickness were prepared by thermal plasma spray CVD on Si(1 0 0) substrates covered with a native oxide layer. The effect of the growth rate on film orientation and surface morphology has been studied. It was shown that both growth temperature and growth rate are responsible for producing highly (0 0 6)-textured films. The films do not exhibit any effect of the Nb/Ta ratio on their orientation.",

author = "Kulinich, {S. A.} and H. Yamamoto and J. Shibata and K. Terashima and T. Yoshida",

note = "Funding Information: S.A.K. acknowledges the support of the Japan Society for the Promotion of Science (JSPS). This work was financially supported by JSPS under the program {\textquoteleft}Research for the Future{\textquoteright} (JSPS-RFTF Grant No. 97R15301).; Proceedinggs of the 14th Symposium on Plasma Science for Marteri (SPSM-14) ; Conference date: 13-06-2001 Through 14-06-2001",

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doi = "10.1016/S0040-6090(02)00013-5",

language = "English",

volume = "407",

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journal = "Thin Solid Films",

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T1 - Lithium niobate-tantalate thin films on Si by thermal plasma spray CVD

AU - Kulinich, S. A.

AU - Yamamoto, H.

AU - Shibata, J.

AU - Terashima, K.

AU - Yoshida, T.

N1 - Funding Information: S.A.K. acknowledges the support of the Japan Society for the Promotion of Science (JSPS). This work was financially supported by JSPS under the program ‘Research for the Future’ (JSPS-RFTF Grant No. 97R15301).

PY - 2002/3/22

Y1 - 2002/3/22

N2 - Highly (0 0 6)-oriented lithium niobate-tantalate (LiNb0.5Ta0.5O3 and LiNb0.2Ta0.8O3) thin films with submicron thickness were prepared by thermal plasma spray CVD on Si(1 0 0) substrates covered with a native oxide layer. The effect of the growth rate on film orientation and surface morphology has been studied. It was shown that both growth temperature and growth rate are responsible for producing highly (0 0 6)-textured films. The films do not exhibit any effect of the Nb/Ta ratio on their orientation.

AB - Highly (0 0 6)-oriented lithium niobate-tantalate (LiNb0.5Ta0.5O3 and LiNb0.2Ta0.8O3) thin films with submicron thickness were prepared by thermal plasma spray CVD on Si(1 0 0) substrates covered with a native oxide layer. The effect of the growth rate on film orientation and surface morphology has been studied. It was shown that both growth temperature and growth rate are responsible for producing highly (0 0 6)-textured films. The films do not exhibit any effect of the Nb/Ta ratio on their orientation.

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U2 - 10.1016/S0040-6090(02)00013-5

DO - 10.1016/S0040-6090(02)00013-5

M3 - Conference article

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SN - 0040-6090

VL - 407

SP - 60

EP - 66

JO - Thin Solid Films

JF - Thin Solid Films

IS - 1-2

T2 - Proceedinggs of the 14th Symposium on Plasma Science for Marteri (SPSM-14)

Y2 - 13 June 2001 through 14 June 2001

ER -

Lithium niobate-tantalate thin films on Si by thermal plasma spray CVD

Abstract

All Science Journal Classification (ASJC) codes

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