Lithium niobate-tantalate thin films on Si by thermal plasma spray CVD

S. A. Kulinich, H. Yamamoto, J. Shibata, K. Terashima, T. Yoshida

Research output: Contribution to journalConference articlepeer-review

10 Citations (Scopus)


Highly (0 0 6)-oriented lithium niobate-tantalate (LiNb0.5Ta0.5O3 and LiNb0.2Ta0.8O3) thin films with submicron thickness were prepared by thermal plasma spray CVD on Si(1 0 0) substrates covered with a native oxide layer. The effect of the growth rate on film orientation and surface morphology has been studied. It was shown that both growth temperature and growth rate are responsible for producing highly (0 0 6)-textured films. The films do not exhibit any effect of the Nb/Ta ratio on their orientation.

Original languageEnglish
Pages (from-to)60-66
Number of pages7
JournalThin Solid Films
Issue number1-2
Publication statusPublished - Mar 22 2002
Externally publishedYes
EventProceedinggs of the 14th Symposium on Plasma Science for Marteri (SPSM-14) - Tokyo, Japan
Duration: Jun 13 2001Jun 14 2001

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry


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