Latest trends in ultra-precision polishing/chemical mechanical polishing (CMP) (Part 1) - Development and principle for polishing

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	803-808
Number of pages	6
Journal	Toraibarojisuto/Journal of Japanese Society of Tribologists
Volume	55
Issue number	11
Publication status	Published - 2010

All Science Journal Classification (ASJC) codes

@article{ccc0b736c77a457b9400871b95896150,

title = "Latest trends in ultra-precision polishing/chemical mechanical polishing (CMP) (Part 1) - Development and principle for polishing",

author = "Toshiro Doi and Syuhei Kurokawa and Osamu Ohnishi and Tsutomu Yamazaki",

year = "2010",

language = "English",

volume = "55",

pages = "803--808",

journal = "Toraibarojisuto/Journal of Japanese Society of Tribologists",

issn = "0915-1168",

publisher = "Japanese Society of Tribologists",

number = "11",

}

TY - JOUR

T1 - Latest trends in ultra-precision polishing/chemical mechanical polishing (CMP) (Part 1) - Development and principle for polishing

AU - Doi, Toshiro

AU - Kurokawa, Syuhei

AU - Ohnishi, Osamu

AU - Yamazaki, Tsutomu

PY - 2010

Y1 - 2010

UR - https://www.scopus.com/pages/publications/78651426119

UR - https://www.scopus.com/pages/publications/78651426119#tab=citedBy

M3 - Article

AN - SCOPUS:78651426119

SN - 0915-1168

VL - 55

SP - 803

EP - 808

JO - Toraibarojisuto/Journal of Japanese Society of Tribologists

JF - Toraibarojisuto/Journal of Japanese Society of Tribologists

IS - 11

ER -