@article{a25f9c2b55ef4b588a7ea595c622a3a6,
title = "Latest trends in ultra-precision polishing/chemical mechanical polishing (CMP) (Part 2) - CMP technology and tribo-chemical assisted polishing",
author = "Toshiro Doi and Syuhei Kurokawa and Osamu Ohnishi and Tsutomu Yamazaki",
year = "2010",
language = "English",
volume = "55",
pages = "809--813",
journal = "Toraibarojisuto/Journal of Japanese Society of Tribologists",
issn = "0915-1168",
publisher = "Japanese Society of Tribologists",
number = "11",
}