Latest trends in ultra-precision polishing/chemical mechanical polishing (CMP) (Part 1) - Development and principle for polishing

Toshiro Doi, Syuhei Kurokawa, Osamu Ohnishi, Tsutomu Yamazaki

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)803-808
Number of pages6
JournalToraibarojisuto/Journal of Japanese Society of Tribologists
Issue number11
Publication statusPublished - Dec 1 2010

All Science Journal Classification (ASJC) codes

  • Mechanics of Materials
  • Mechanical Engineering
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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