TY - JOUR
T1 - Laser-ablated plasma for deposition of ZnO thin films on various substrates
AU - Ohshima, T.
AU - Thareja, R. K.
AU - Yamagata, Y.
AU - Ikegami, T.
AU - Ebihara, K.
AU - Narayan, J.
N1 - Copyright:
Copyright 2005 Elsevier B.V., All rights reserved.
PY - 2001/9/12
Y1 - 2001/9/12
N2 - We report optical and structural properties of ZnO films deposited by pulsed laser deposition technique on (100) n-type silicon and quartz substrates at various pressures of back ground gas. ZnO plasma was created using KrF laser (248 nm) at various pressures of the ambient gas, oxygen. Laser induced plasma at varying fluence on the target was investigated using optical emission spectroscopy and 2-D images of the expanding plumes. X-ray diffraction, atomic force microscopy, and spectro-photometry were used to characterize as grown films.
AB - We report optical and structural properties of ZnO films deposited by pulsed laser deposition technique on (100) n-type silicon and quartz substrates at various pressures of back ground gas. ZnO plasma was created using KrF laser (248 nm) at various pressures of the ambient gas, oxygen. Laser induced plasma at varying fluence on the target was investigated using optical emission spectroscopy and 2-D images of the expanding plumes. X-ray diffraction, atomic force microscopy, and spectro-photometry were used to characterize as grown films.
UR - http://www.scopus.com/inward/record.url?scp=0000139138&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0000139138&partnerID=8YFLogxK
U2 - 10.1016/S1468-6996(01)00132-2
DO - 10.1016/S1468-6996(01)00132-2
M3 - Article
AN - SCOPUS:0000139138
SN - 1468-6996
VL - 2
SP - 517
EP - 523
JO - Science and Technology of Advanced Materials
JF - Science and Technology of Advanced Materials
IS - 3-4
ER -