TY - JOUR
T1 - Large-scale fabrication of thulium iron garnet film with perpendicular magnetic anisotropy using RF magnetron sputtering
AU - Agusutrisno, Marlis N.
AU - Obinata, Sora
AU - Okumura, Takamasa
AU - Kamataki, Kunihiro
AU - Itagaki, Naho
AU - Koga, Kazunori
AU - Shiratani, Masaharu
AU - Yamashita, Naoto
N1 - Publisher Copyright:
© 2024 The Japan Society of Applied Physics.
PY - 2024/7/1
Y1 - 2024/7/1
N2 - Large-scale fabrication of thulium iron garnet (TmIG) films on gadolinium gallium garnet (GGG) substrates, with a total area of 25 cm2, has been demonstrated by rotating substrate holders during on-axis sputtering. By optimizing the growth parameters based on the pressure and flow rate of the oxygen ratio, a Tm/Fe ratio of 0.65 was obtained, which is close to the stoichiometry of TmIG. The increase in post-annealing temperature has induced the growth of the TmIG structure by the strain of the lattice constant mechanism. At the highest post-annealing temperature, the crystal structure of TmIG (444) and the perpendicular magnetic anisotropy (PMA) were obtained. This result demonstrates the potential method for large-scale fabrication of TmIG film with PMA.
AB - Large-scale fabrication of thulium iron garnet (TmIG) films on gadolinium gallium garnet (GGG) substrates, with a total area of 25 cm2, has been demonstrated by rotating substrate holders during on-axis sputtering. By optimizing the growth parameters based on the pressure and flow rate of the oxygen ratio, a Tm/Fe ratio of 0.65 was obtained, which is close to the stoichiometry of TmIG. The increase in post-annealing temperature has induced the growth of the TmIG structure by the strain of the lattice constant mechanism. At the highest post-annealing temperature, the crystal structure of TmIG (444) and the perpendicular magnetic anisotropy (PMA) were obtained. This result demonstrates the potential method for large-scale fabrication of TmIG film with PMA.
KW - Tm/Fe ratio
KW - TmIG film area
KW - TmIG with PMA
KW - saturation field enhanced by annealing
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U2 - 10.35848/1347-4065/ad5aff
DO - 10.35848/1347-4065/ad5aff
M3 - Article
AN - SCOPUS:85199512025
SN - 0021-4922
VL - 63
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 7
M1 - 07SP06
ER -