Large-aperture focusing of x rays with micropore optics using dry etching of silicon wafers

Yuichiro Ezoe; Teppei Moriyama; Tomohiro Ogawa; Takuya Kakiuchi; Ikuyuki Mitsuishi; Kazuhisa Mitsuda; Tatsuhiko Aoki; Kohei Morishita; Kazuo Nakajima

doi:10.1364/OL.37.000779

Large-aperture focusing of x rays with micropore optics using dry etching of silicon wafers

Yuichiro Ezoe, Teppei Moriyama, Tomohiro Ogawa, Takuya Kakiuchi, Ikuyuki Mitsuishi, Kazuhisa Mitsuda, Tatsuhiko Aoki, Kohei Morishita, Kazuo Nakajima

Research output: Contribution to journal › Article › peer-review

21 Citations (Scopus)

Abstract

Large-aperture focusing of Al K? 1.49 keV x-ray photons using micropore optics made from a dry-etched 4 in. (100 mm) silicon wafer is demonstrated. Sidewalls of the micropores are smoothed with high-temperature annealing to work as x-ray mirrors. The wafer is bent to a spherical shape to collect parallel x rays into a focus. Our result supports that this new type of optics allows for the manufacturing of ultralight-weight and high-performance x-ray imaging optics with large apertures at low cost.

Original language	English
Pages (from-to)	779-781
Number of pages	3
Journal	Optics Letters
Volume	37
Issue number	5
DOIs	https://doi.org/10.1364/OL.37.000779
Publication status	Published - Mar 1 2012
Externally published	Yes

All Science Journal Classification (ASJC) codes

Atomic and Molecular Physics, and Optics

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10.1364/OL.37.000779

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abstract = "Large-aperture focusing of Al K? 1.49 keV x-ray photons using micropore optics made from a dry-etched 4 in. (100 mm) silicon wafer is demonstrated. Sidewalls of the micropores are smoothed with high-temperature annealing to work as x-ray mirrors. The wafer is bent to a spherical shape to collect parallel x rays into a focus. Our result supports that this new type of optics allows for the manufacturing of ultralight-weight and high-performance x-ray imaging optics with large apertures at low cost.",

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doi = "10.1364/OL.37.000779",

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AU - Ezoe, Yuichiro

AU - Moriyama, Teppei

AU - Ogawa, Tomohiro

AU - Kakiuchi, Takuya

AU - Mitsuishi, Ikuyuki

AU - Mitsuda, Kazuhisa

AU - Aoki, Tatsuhiko

AU - Morishita, Kohei

AU - Nakajima, Kazuo

PY - 2012/3/1

Y1 - 2012/3/1

N2 - Large-aperture focusing of Al K? 1.49 keV x-ray photons using micropore optics made from a dry-etched 4 in. (100 mm) silicon wafer is demonstrated. Sidewalls of the micropores are smoothed with high-temperature annealing to work as x-ray mirrors. The wafer is bent to a spherical shape to collect parallel x rays into a focus. Our result supports that this new type of optics allows for the manufacturing of ultralight-weight and high-performance x-ray imaging optics with large apertures at low cost.

AB - Large-aperture focusing of Al K? 1.49 keV x-ray photons using micropore optics made from a dry-etched 4 in. (100 mm) silicon wafer is demonstrated. Sidewalls of the micropores are smoothed with high-temperature annealing to work as x-ray mirrors. The wafer is bent to a spherical shape to collect parallel x rays into a focus. Our result supports that this new type of optics allows for the manufacturing of ultralight-weight and high-performance x-ray imaging optics with large apertures at low cost.

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Large-aperture focusing of x rays with micropore optics using dry etching of silicon wafers

Abstract

All Science Journal Classification (ASJC) codes

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