Ion Source and Stripper Gas Cell Developments for the 6 MeV Tandem Heavy Ion Beam Probe on the Large Helical Device

A. Taniike; M. Sasao; A. Fujisawa; H. Iguchi; Y. Hamada; J. Fujita; M. Wada; Y. Mori

doi:10.1109/27.310651

Ion Source and Stripper Gas Cell Developments for the 6 MeV Tandem Heavy Ion Beam Probe on the Large Helical Device

A. Taniike, M. Sasao, A. Fujisawa, H. Iguchi, Y. Hamada, J. Fujita, M. Wada, Y. Mori

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

The feasibility of a heavy ion beam with a tandem acceleration system for plasma potential measurement has been examined. A plasma-sputter-type ion source which produces an Au-beam with an energy width as small as 6 eV and a reasonably small emittance of π mm-mrad (MeV)1/2, can be used for this purpose. Suitable target gas thickness for a charge exchange is estimated to be less than 1015atom/cm2at the 3 MV terminal voltage.

Original language	English
Pages (from-to)	430-434
Number of pages	5
Journal	IEEE Transactions on Plasma Science
Volume	22
Issue number	4
DOIs	https://doi.org/10.1109/27.310651
Publication status	Published - Aug 1994
Externally published	Yes

All Science Journal Classification (ASJC) codes

Nuclear and High Energy Physics
Condensed Matter Physics

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abstract = "The feasibility of a heavy ion beam with a tandem acceleration system for plasma potential measurement has been examined. A plasma-sputter-type ion source which produces an Au-beam with an energy width as small as 6 eV and a reasonably small emittance of π mm-mrad (MeV)1/2, can be used for this purpose. Suitable target gas thickness for a charge exchange is estimated to be less than 1015atom/cm2at the 3 MV terminal voltage.",

author = "A. Taniike and M. Sasao and A. Fujisawa and H. Iguchi and Y. Hamada and J. Fujita and M. Wada and Y. Mori",

year = "1994",

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AU - Taniike, A.

AU - Sasao, M.

AU - Fujisawa, A.

AU - Iguchi, H.

AU - Hamada, Y.

AU - Fujita, J.

AU - Wada, M.

AU - Mori, Y.

PY - 1994/8

Y1 - 1994/8

N2 - The feasibility of a heavy ion beam with a tandem acceleration system for plasma potential measurement has been examined. A plasma-sputter-type ion source which produces an Au-beam with an energy width as small as 6 eV and a reasonably small emittance of π mm-mrad (MeV)1/2, can be used for this purpose. Suitable target gas thickness for a charge exchange is estimated to be less than 1015atom/cm2at the 3 MV terminal voltage.

AB - The feasibility of a heavy ion beam with a tandem acceleration system for plasma potential measurement has been examined. A plasma-sputter-type ion source which produces an Au-beam with an energy width as small as 6 eV and a reasonably small emittance of π mm-mrad (MeV)1/2, can be used for this purpose. Suitable target gas thickness for a charge exchange is estimated to be less than 1015atom/cm2at the 3 MV terminal voltage.

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JF - IEEE Transactions on Plasma Science

IS - 4

ER -

Ion Source and Stripper Gas Cell Developments for the 6 MeV Tandem Heavy Ion Beam Probe on the Large Helical Device

Abstract

All Science Journal Classification (ASJC) codes

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