TY - JOUR
T1 - Investigation of a step-like output energy decrease observed in an ArF excimer laser for microlithography
AU - Sumitani, Akira
AU - Ishihara, Takanobu
AU - Fukuoka, Teruaki
AU - Uchino, Kiichiro
PY - 2006/10
Y1 - 2006/10
N2 - A step-like decrease of the output energy of an ArF excimer laser for microlithography has been observed during high-repetition rate and high-power operation. The reason for the step-like energy decrease was traced to oxygen by adding 50ppm of various gas impurities to the laser gas. It is supposed that the energy decrease is caused by laser light absorption due to the oxygen or to some kinds of oxygen compounds because no change was observed in ArF and XeF emission intensities which were monitored as measures of excimer formation, Xe content, and discharge states.
AB - A step-like decrease of the output energy of an ArF excimer laser for microlithography has been observed during high-repetition rate and high-power operation. The reason for the step-like energy decrease was traced to oxygen by adding 50ppm of various gas impurities to the laser gas. It is supposed that the energy decrease is caused by laser light absorption due to the oxygen or to some kinds of oxygen compounds because no change was observed in ArF and XeF emission intensities which were monitored as measures of excimer formation, Xe content, and discharge states.
UR - http://www.scopus.com/inward/record.url?scp=34547850863&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=34547850863&partnerID=8YFLogxK
U2 - 10.1143/JJAP.45.L1030
DO - 10.1143/JJAP.45.L1030
M3 - Article
AN - SCOPUS:34547850863
SN - 0021-4922
VL - 45
SP - L1030-L1032
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 37-41
ER -