In-situ X-ray topography on crystal growth of silicon carbide

Hirotaka Yamaguchi; Shin Ichi Nishizawa; Tomohisa Kato; Naoki Oyanagi; Sadafumi Yoshida; Kazuo Arai

doi:10.2207/qjjws1943.70.6_641

In-situ X-ray topography on crystal growth of silicon carbide

Hirotaka Yamaguchi, Shin Ichi Nishizawa, Tomohisa Kato, Naoki Oyanagi, Sadafumi Yoshida, Kazuo Arai

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	23-27
Number of pages	5
Journal	Yosetsu Gakkai Shi/Journal of the Japan Welding Society
Volume	70
Issue number	6
DOIs	https://doi.org/10.2207/qjjws1943.70.6_641
Publication status	Published - 2001
Externally published	Yes

All Science Journal Classification (ASJC) codes

Mechanics of Materials
Mechanical Engineering
Surfaces, Coatings and Films
Metals and Alloys

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10.2207/qjjws1943.70.6_641

Cite this

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title = "In-situ X-ray topography on crystal growth of silicon carbide",

author = "Hirotaka Yamaguchi and Nishizawa, {Shin Ichi} and Tomohisa Kato and Naoki Oyanagi and Sadafumi Yoshida and Kazuo Arai",

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AU - Yamaguchi, Hirotaka

AU - Nishizawa, Shin Ichi

AU - Kato, Tomohisa

AU - Oyanagi, Naoki

AU - Yoshida, Sadafumi

AU - Arai, Kazuo

PY - 2001

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SN - 0021-4787

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JO - Yosetsu Gakkai Shi/Journal of the Japan Welding Society

JF - Yosetsu Gakkai Shi/Journal of the Japan Welding Society

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In-situ X-ray topography on crystal growth of silicon carbide

All Science Journal Classification (ASJC) codes

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