TY - JOUR
T1 - In situ measurement of capacitance
T2 - A method for fabricating nanoglass
AU - Ohta, Y.
AU - Kitayama, M.
AU - Kaneko, K.
AU - Toh, S.
AU - Shimizu, F.
AU - Morinaga, K.
PY - 2005/6
Y1 - 2005/6
N2 - The capacitance of the Na 2O-SiO 2 glass was measured in situ during heat treatment at various frequencies, 20, 100, 1, 3, 10, and 30 kHz. It was found that the capacitance of the glass abruptly decreases after a certain duration. The glass was quenched at this stage. It was confirmed by the X-ray diffraction and transmission electron microscopy that this decrease of capacitance was associated with the formation of crystallites in the glass matrix. The size of crystallites was observed to be in the range of about 10 nm.
AB - The capacitance of the Na 2O-SiO 2 glass was measured in situ during heat treatment at various frequencies, 20, 100, 1, 3, 10, and 30 kHz. It was found that the capacitance of the glass abruptly decreases after a certain duration. The glass was quenched at this stage. It was confirmed by the X-ray diffraction and transmission electron microscopy that this decrease of capacitance was associated with the formation of crystallites in the glass matrix. The size of crystallites was observed to be in the range of about 10 nm.
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U2 - 10.1111/j.1551-2916.2005.00257.x
DO - 10.1111/j.1551-2916.2005.00257.x
M3 - Article
AN - SCOPUS:27644504905
SN - 0002-7820
VL - 88
SP - 1634
EP - 1636
JO - Journal of the American Ceramic Society
JF - Journal of the American Ceramic Society
IS - 6
ER -