TY - JOUR
T1 - In-flight melting behavior of granulated alkali-free raw material in induction thermal plasmas
AU - Yao, Yaochun
AU - Watanabe, Takayuki
N1 - Funding Information:
Acknowledgments The financial support provided by Strategic Development of Energy Conservation Technology Project of NEDO of Japan is gratefully acknowledged.
PY - 2013/12
Y1 - 2013/12
N2 - A new in-flight glass melting technology with induction thermal plasmas was developed to reduce the energy consumption and the emissions of greenhouse gases for glass production. The effects of carrier gas on the in-flight melting behavior of granulated alkali-free raw material were investigated by various modern analyses. Results show that the particles have smooth spherical surface and compact structure after heat treatment. As the carrier gas flow rate increases, the vitrification degree decreases and the average diameter increases. Higher vitrification results in more shrinkage of particle. The carbonates in raw material decompose completely during in-flight melting. The highest volatilization of B2O3 is attributed to more heat transferred from plasmas to particles at the lowest carrier gas flow rate.
AB - A new in-flight glass melting technology with induction thermal plasmas was developed to reduce the energy consumption and the emissions of greenhouse gases for glass production. The effects of carrier gas on the in-flight melting behavior of granulated alkali-free raw material were investigated by various modern analyses. Results show that the particles have smooth spherical surface and compact structure after heat treatment. As the carrier gas flow rate increases, the vitrification degree decreases and the average diameter increases. Higher vitrification results in more shrinkage of particle. The carbonates in raw material decompose completely during in-flight melting. The highest volatilization of B2O3 is attributed to more heat transferred from plasmas to particles at the lowest carrier gas flow rate.
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U2 - 10.1007/s11090-013-9490-4
DO - 10.1007/s11090-013-9490-4
M3 - Article
AN - SCOPUS:84888003979
SN - 0272-4324
VL - 33
SP - 1111
EP - 1119
JO - Plasma Chemistry and Plasma Processing
JF - Plasma Chemistry and Plasma Processing
IS - 6
ER -
