H+ implantation-enhanced stress relaxation in c-Si 1-xGex on SiO2 during oxidation-induced Ge condensation process

T. Sadoh, R. Matsuura, M. Ninomiya, M. Nakamae, T. Enokida, H. Hagino, M. Miyao

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

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