TY - JOUR
T1 - H∞ loop shaping control for plasma vertical position instability on QUEST
AU - Liu, Xiaolong
AU - Nakamura, Kazuo
AU - Yoshisue, Tatsuya
AU - Mitarai, Osamu
AU - Hasegawa, Makoto
AU - Tokunaga, Kazutoshi
AU - Xue, Erbing
AU - Zushi, Hideki
AU - Hanada, Kazuaki
AU - Fujisawa, Akihide
AU - Idei, Hiroshi
AU - Kawasaki, Shoji
AU - Nakashima, Hisatoshi
AU - Higashijima, Aki
AU - Araki, Kuniaki
PY - 2013/1/1
Y1 - 2013/1/1
N2 - QUEST has a divertor configuration with a high and a negative n-index, and the problem of plasma vertical position instability control in QUEST is still under extensive study for achieving high efficiency plasma. The instability we considered is that the toroidal plasma moves either up or down in the vacuum chamber until it meets the vessel wall and is extinguished. The actively controlled coils (HCU and HCL) outside the vacuum vessel are serially connected in feedback with a measurement of the plasma vertical position to provide stabilizing control. In this work, a robust controller is employed by using the loop synthesis method, and provides robust stability over a wide range of n-index. Moreover, the gain of the robust controller is lower than that of a typical proportional derivative (PD) controller in the operational frequency range; it indicates that the robust controller needs less power consumption than the PD controller does.
AB - QUEST has a divertor configuration with a high and a negative n-index, and the problem of plasma vertical position instability control in QUEST is still under extensive study for achieving high efficiency plasma. The instability we considered is that the toroidal plasma moves either up or down in the vacuum chamber until it meets the vessel wall and is extinguished. The actively controlled coils (HCU and HCL) outside the vacuum vessel are serially connected in feedback with a measurement of the plasma vertical position to provide stabilizing control. In this work, a robust controller is employed by using the loop synthesis method, and provides robust stability over a wide range of n-index. Moreover, the gain of the robust controller is lower than that of a typical proportional derivative (PD) controller in the operational frequency range; it indicates that the robust controller needs less power consumption than the PD controller does.
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U2 - 10.1088/1009-0630/15/3/21
DO - 10.1088/1009-0630/15/3/21
M3 - Article
AN - SCOPUS:84875394318
SN - 1009-0630
VL - 15
SP - 295
EP - 299
JO - Plasma Science and Technology
JF - Plasma Science and Technology
IS - 3
ER -