High performance of compact radical monitoring probe in H2 / N2 mixture plasma

Chang Sung Moon; Keigo Takeda; Seigo Takashima; Makoto Sekine; Yuichi Setsuhara; Masaharu Shiratani; Masaru Hori

doi:10.1116/1.3327926

High performance of compact radical monitoring probe in H₂ / N₂ mixture plasma

Chang Sung Moon, Keigo Takeda, Seigo Takashima, Makoto Sekine, Yuichi Setsuhara, Masaharu Shiratani, Masaru Hori

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

The authors have developed a compact monitoring probe for measuring the spatial distribution of the atomic radical densities of hydrogen and nitrogen, employing a vacuum ultraviolet absorption spectroscopy with a high pressure microdischarge hollow cathode lamp as a light source. In order to achieve the high performance of measuring the spatial distribution of atomic radical densities, they have tried to realize spatially nonuniform plasma discharge by parallel plates with respective different sizes. It was confirmed that the compact radical monitoring probe enabled one to measure the spatial distribution of atomic radical densities in the plasma precisely. In addition, the etching characteristics of a low- k film were analyzed in H₂ / N₂ mixture plasma by internal parameters such as radical and ion fluxes coming to the substrate.

Original language	English
Pages (from-to)	L17-L20
Journal	Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Volume	28
Issue number	2
DOIs	https://doi.org/10.1116/1.3327926
Publication status	Published - 2010
Externally published	Yes

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Instrumentation
Process Chemistry and Technology
Surfaces, Coatings and Films
Electrical and Electronic Engineering
Materials Chemistry

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10.1116/1.3327926

Cite this

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title = "High performance of compact radical monitoring probe in H2 / N2 mixture plasma",

abstract = "The authors have developed a compact monitoring probe for measuring the spatial distribution of the atomic radical densities of hydrogen and nitrogen, employing a vacuum ultraviolet absorption spectroscopy with a high pressure microdischarge hollow cathode lamp as a light source. In order to achieve the high performance of measuring the spatial distribution of atomic radical densities, they have tried to realize spatially nonuniform plasma discharge by parallel plates with respective different sizes. It was confirmed that the compact radical monitoring probe enabled one to measure the spatial distribution of atomic radical densities in the plasma precisely. In addition, the etching characteristics of a low- k film were analyzed in H2 / N2 mixture plasma by internal parameters such as radical and ion fluxes coming to the substrate.",

author = "Moon, {Chang Sung} and Keigo Takeda and Seigo Takashima and Makoto Sekine and Yuichi Setsuhara and Masaharu Shiratani and Masaru Hori",

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T1 - High performance of compact radical monitoring probe in H2 / N2 mixture plasma

AU - Moon, Chang Sung

AU - Takeda, Keigo

AU - Takashima, Seigo

AU - Sekine, Makoto

AU - Setsuhara, Yuichi

AU - Shiratani, Masaharu

AU - Hori, Masaru

N1 - Funding Information: The authors are grateful for the financial support provided by Core Research for Evolutional Science and Technology (CREST) of the Japan Science and Technology Agency (JST).

PY - 2010

Y1 - 2010

N2 - The authors have developed a compact monitoring probe for measuring the spatial distribution of the atomic radical densities of hydrogen and nitrogen, employing a vacuum ultraviolet absorption spectroscopy with a high pressure microdischarge hollow cathode lamp as a light source. In order to achieve the high performance of measuring the spatial distribution of atomic radical densities, they have tried to realize spatially nonuniform plasma discharge by parallel plates with respective different sizes. It was confirmed that the compact radical monitoring probe enabled one to measure the spatial distribution of atomic radical densities in the plasma precisely. In addition, the etching characteristics of a low- k film were analyzed in H2 / N2 mixture plasma by internal parameters such as radical and ion fluxes coming to the substrate.

AB - The authors have developed a compact monitoring probe for measuring the spatial distribution of the atomic radical densities of hydrogen and nitrogen, employing a vacuum ultraviolet absorption spectroscopy with a high pressure microdischarge hollow cathode lamp as a light source. In order to achieve the high performance of measuring the spatial distribution of atomic radical densities, they have tried to realize spatially nonuniform plasma discharge by parallel plates with respective different sizes. It was confirmed that the compact radical monitoring probe enabled one to measure the spatial distribution of atomic radical densities in the plasma precisely. In addition, the etching characteristics of a low- k film were analyzed in H2 / N2 mixture plasma by internal parameters such as radical and ion fluxes coming to the substrate.

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High performance of compact radical monitoring probe in H₂ / N₂ mixture plasma

Abstract

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