High Hole-Mobility Ge p-MOSFET with HfGe Schottky Source/Drain

Research output: Contribution to conference › Paper › peer-review

Original language	English
Pages	737-738
Number of pages	2
DOIs	https://doi.org/10.7567/ssdm.2012.d-4-2
Publication status	Published - Sept 26 2012
Event	2012 International Conference on Solid State Devices and Materials (SSDM2012) - Kyoto International Conference Center, Kyoto, Japan Duration: Sept 25 2012 → Sept 27 2012

Conference	2012 International Conference on Solid State Devices and Materials (SSDM2012)
Country/Territory	Japan
City	Kyoto
Period	9/25/12 → 9/27/12

Access to Document

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title = "High Hole-Mobility Ge p-MOSFET with HfGe Schottky Source/Drain",

author = "T. Sada and K. Yamamoto and H. Yang and D. Wang and H. Nakashima",

year = "2012",

month = sep,

day = "26",

doi = "10.7567/ssdm.2012.d-4-2",

language = "English",

pages = "737--738",

note = "2012 International Conference on Solid State Devices and Materials (SSDM2012) ; Conference date: 25-09-2012 Through 27-09-2012",

}

TY - CONF

T1 - High Hole-Mobility Ge p-MOSFET with HfGe Schottky Source/Drain

AU - Sada, T.

AU - Yamamoto, K.

AU - Yang, H.

AU - Wang, D.

AU - Nakashima, H.

PY - 2012/9/26

Y1 - 2012/9/26

U2 - 10.7567/ssdm.2012.d-4-2

DO - 10.7567/ssdm.2012.d-4-2

M3 - Paper

SP - 737

EP - 738

T2 - 2012 International Conference on Solid State Devices and Materials (SSDM2012)

Y2 - 25 September 2012 through 27 September 2012

ER -